Mr. Shuichiro Ohara Profile

Shuichiro Ohara

Director at Nippon Control System Corp

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Publications (7)

Proceedings Article | 12 November 2024 Poster + Paper

Practical challenges of Bézier curves in mask data preparation

Masakazu Hamaji, Rie Funoki, Taigo Fujii, Aki Shigeta, Tomokazu Hayashi, Shuichiro Ohara

Proceedings Volume 13216, 1321621 (2024) https://doi.org/10.1117/12.3034563

KEYWORDS: Tolerancing, Semiconducting wafers, Data processing, Data conversion

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Proceedings Article | 29 September 2023 Paper

The impact of real curve layout in mask data preparation

Masakazu Hamaji, Toshikazu Hayashi, Aki Shigeta, Rie Funoki, Shuichiro Ohara

Proceedings Volume 12915, 129150C (2023) https://doi.org/10.1117/12.2687544

KEYWORDS: Tolerancing, Optical proximity correction, Mathematical optimization, Algorithm development, Manufacturing, Lithography, Photomasks

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Proceedings Article | 16 October 2017 Presentation + Paper

Manufacturing challenges for curvilinear masks

Chris Spence, Quan Zhang, Vincent Shu, Been-Der Chen, Stanislas Baron, Yasuko Saito, Masakazu Hamaji, Yasuaki Horima, Shuichiro Ohara

Proceedings Volume 10451, 1045104 (2017) https://doi.org/10.1117/12.2280470

KEYWORDS: Photomasks, Optical proximity correction, Lithography, SRAF, Mask making, Process modeling

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Proceedings Article | 4 October 2016 Paper

OPC care-area feedforwarding to MPC

Brian Dillon, Yi-Hsing Peng, Masakazu Hamaji, Dai Tsunoda, Tomoyuki Muramatsu, Shuichiro Ohara, Yi Zou, Vincent Arnoux, Stanislas Baron, Xiaolong Zhang

Proceedings Volume 9985, 99851A (2016) https://doi.org/10.1117/12.2242972

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

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Proceedings Article | 8 October 2014 Paper

MDP challenges from a software provider's perspective

Shuichiro Ohara

Proceedings Volume 9235, 92350T (2014) https://doi.org/10.1117/12.2070163

KEYWORDS: Photomasks, Optical proximity correction, Vestigial sideband modulation, Resolution enhancement technologies, Neodymium, Lithography, Computing systems, Extreme ultraviolet, Modulation, Acquisition tracking and pointing

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Proceedings Article | 29 September 2010 Paper

Affordable and process window increasing full chip ILT masks

Guangming Xiao, Dave Irby, Tom Cecil, David Kim, Shuichiro Ohara, Isao Aburatani

Proceedings Volume 7823, 78233T (2010) https://doi.org/10.1117/12.866131

KEYWORDS: Photomasks, SRAF, Vestigial sideband modulation, Optical alignment, Critical dimension metrology, Lithography, Optical proximity correction, Photovoltaics, Resolution enhancement technologies, Image segmentation

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Proceedings Article | 25 September 2010 Paper

Study of data I/O performance on distributed disk system in mask data preparation

Shuichiro Ohara, Hiroyuki Odaira, Tomoyuki Chikanaga, Masakazu Hamaji, Yasuharu Yoshioka

Proceedings Volume 7823, 78233C (2010) https://doi.org/10.1117/12.864250

KEYWORDS: Nondestructive evaluation, Distributed computing, Data storage servers, Databases, Data storage, Data communications, Control systems, Photomask technology, Current controlled current source, Data conversion

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Showing 5 of 7 publications

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