Small pitch overlay imaging metrology targets for tight OPO control

Nikhil Aditya Kumar Roy; Richard Housley; Suresh Kumar; Ranga Reddy; Dan Engelhard; Hao Wang; Atsushi Miyafuji; Toshiharu Nishiyama; Yoel Feler; Diana Shaphirov; Mark Ghinovker; Ido Ashuah; Yoav Grauer; Yonglei Li

doi:10.1117/12.3009769

9 April 2024 Small pitch overlay imaging metrology targets for tight OPO control

Nikhil Aditya Kumar Roy, Richard Housley, Suresh Kumar, Ranga Reddy, Dan Engelhard, Hao Wang, Atsushi Miyafuji, Toshiharu Nishiyama, Yoel Feler, Diana Shaphirov, Mark Ghinovker, Ido Ashuah, Yoav Grauer, Yonglei Li

Author Affiliations +

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129551V (2024) https://doi.org/10.1117/12.3009769
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Sub-2nm On Product Overlay (OPO), scribe line width reduction, and high-order scanner correctibles are driving innovative overlay (OVL) targets. One promising new imaging-based overlay (IBO) OVL target to address such challenging trends in multiple semiconductor segments is a small pitch AIM (sAIM). sAIM is in essence an IBO target with grating (previous layer) beside grating (current layer) which could be placed in a few layouts: square, rectangular, and Mosaic. In this work, we will present the sAIM operational concept and performance including Total Measurement Uncertainty (TMU), residuals, and accuracy (ADI on-target offset vs. ACI on-device or target), which is often referred to as Non-Zero Offset (NZO).

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(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Nikhil Aditya Kumar Roy, Richard Housley, Suresh Kumar, Ranga Reddy, Dan Engelhard, Hao Wang, Atsushi Miyafuji, Toshiharu Nishiyama, Yoel Feler, Diana Shaphirov, Mark Ghinovker, Ido Ashuah, Yoav Grauer, and Yonglei Li "Small pitch overlay imaging metrology targets for tight OPO control", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129551V (9 April 2024); https://doi.org/10.1117/12.3009769

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