Photoresist surface induction and its effect on swing behavior

Steven G. Hansen; Rodney J. Hurditch; David J. Brzozowy; Stewart A. Robertson

doi:10.1117/12.154798

15 September 1993 Photoresist surface induction and its effect on swing behavior

Steven G. Hansen, Rodney J. Hurditch, David J. Brzozowy, Stewart A. Robertson

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154798
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Thin film optical interference causes a sinusoidal variation in lithographic properties with film thickness known as the swing effect. The most well known manifestations are the threshold clearing energy (E₀) and critical dimension (CD) swings which arise due to variations in the in-coupling efficiency of light. The E₀ swing is conceptually simple, requiring only that the amount of photo-active compound (PAC) conversion is constant within a swing film thickness cycle. The present work verifies that E₀ swing is a purely optical effect and is independent of bulk dissolution curve details. For resists of identical optical properties, the faster one will have the lower E₀ swing. `Secondary' swing effects, defined here as lithographic changes arising due to remnant standing wave phase at the film surface, include variations in gamma, resolution, focus latitude, and profile. Some i-line photoresists, particularly those which give significant surface induction in development, show large oscillations in these performance measures depending on swing phase.

Citation Download Citation

Steven G. Hansen, Rodney J. Hurditch, David J. Brzozowy, and Stewart A. Robertson "Photoresist surface induction and its effect on swing behavior", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154798

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