Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation

Marina V. Plat; William R. Brunsvold; Randolph S. Smith; Nicholas K. Eib; Christopher F. Lyons

doi:10.1117/12.210348

9 June 1995 Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation

Marina V. Plat, William R. Brunsvold, Randolph S. Smith, Nicholas K. Eib, Christopher F. Lyons

Author Affiliations +

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210348
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

This study evaluates the effect of dyes, including photosensitive dyes, on resist performance such as: swing curve reduction, resist dissolution rate, resolution, dose and focus latitude, scumming, etc. The paper demonstrates good correlation between modeling of the dyed resist performance and experimental results.

Citation Download Citation

Marina V. Plat, William R. Brunsvold, Randolph S. Smith, Nicholas K. Eib, and Christopher F. Lyons "Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210348

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