Mr. William Brunsvold Profile

William Brunsvold

at Ciba Corp

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 24 July 2002 Paper

Evolution of a 193-nm bilayer resist for manufacturing

Ranee Kwong, Mahmoud Khojasteh, Margaret Lawson, Timothy Hughes, Pushkara Varanasi, William Brunsvold, Robert Allen, Phillip Brock, Ratnam Sooriyakumaran, Hoa Truong, Arpan Mahorowala, David Medeiros

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474239

KEYWORDS: Silicon, Etching, Polymers, Lithography, Reactive ion etching, 193nm lithography, Photomasks, Manufacturing, Absorbance, Resistance

Read Abstract +

Proceedings Article | 24 August 2001 Paper

193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries

Toru Kajita, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, A. Soyano, A. Kataoka, Mark Slezak, Makoto Shimizu, Pushkara Varanasi, G. Jordahamo, Margaret Lawson, R. Chen, William Brunsvold, Wenjie Li, Robert Allen, Hiroshi Ito, Hoa Truong, Thomas Wallow

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436833

KEYWORDS: Etching, Monochromatic aberrations, Chemistry, Polymers, Lithography, Polymerization, Resistance, Imaging systems, Surface roughness, Transparency

Read Abstract +

Proceedings Article | 24 August 2001 Paper

ArF resist for contact hole application

K. Rex Chen, Margaret Lawson, Timothy Hughes, William Brunsvold, Pushkara Varanasi, Robin Keller, George Jordhamo

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436910

KEYWORDS: Polymers, Floods, Laser induced plasma spectroscopy, Contamination, Photomasks, Semiconducting wafers, Scanners, Printing, Manufacturing, Microelectronics

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)

Pushkara Varanasi, George Jordhamo, Margaret Lawson, K. Rex Chen, William Brunsvold, Timothy Hughes, Robin Keller, Mahmoud Khojasteh, W. Li, Robert Allen, Hiroshi Ito, Juliann Opitz, Hoa Truong, Thomas Wallow

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388280

KEYWORDS: Polymers, Etching, Lithography, Reactive ion etching, Surface roughness, Photomasks, 193nm lithography, Phase shifts, Deep ultraviolet, Photoresist materials

Read Abstract +

Proceedings Article | 11 June 1999 Paper

Improved resolution with advanced negative DUV photoresist with 0.26N capability

Gregory Prokopowicz, Jacque Georger, Eyad Ayyash, James Thackeray, William Brunsvold, Laura Kosbar, Ali Afzali-Kushaa, Jeffrey Gelorme

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350181

KEYWORDS: Deep ultraviolet, Lithography, Phase shifts, Bridges, Polymers, Photoresist materials, Manufacturing, Signal to noise ratio, Reticles, Temperature metrology

Read Abstract +

Proceedings Article | 7 July 1997 Paper

New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices

Will Conley, William Brunsvold, Fred Buehrer, Ronald DellaGuardia, David Dobuzinsky, Timothy Farrell, Hok Ho, Ahmad Katnani, Robin Keller, James Marsh, Paul Muller, Ronald Nunes, Hung Ng, James Oberschmidt, Michael Pike, Deborah Ryan, Tina Cotler-Wagner, Ron Schulz, Hiroshi Ito, Donald Hofer, Gregory Breyta, Debra Fenzel-Alexander, Gregory Wallraff, Juliann Opitz, James Thackeray, George Barclay, James Cameron, Tracy Lindsay, Michael Cronin, Matthew Moynihan, Sassan Nour, Jacque Georger, Mike Mori, Peter Hagerty, Roger Sinta, Thomas Zydowsky

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275830

KEYWORDS: Semiconducting wafers, Photoresist materials, Etching, Polymers, Resistance, Lithography, Silicon, Glasses, Annealing, Photoresist processing

Read Abstract +

Proceedings Article | 7 July 1997 Paper

PHS with inert blocking groups for DUV negative resist

William Brunsvold, Will Conley, Pushkara Varanasi, Mahmoud Khojasteh, Niranjan Patel, Antoinette Molless, Mark Neisser, Gregory Breyta

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275839

KEYWORDS: Deep ultraviolet, Medium wave, Lithography, Polymers, Carbon, Standards development, Excimers, Image processing, Silicon, Ions

Read Abstract +

Proceedings Article | 14 June 1996 Paper

Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP)

Will Conley, Gregory Breyta, William Brunsvold, Richard Di Pietro, Donald Hofer, Steven Holmes, Hiroshi Ito, Ronald Nunes, Gabrielle Fichtl, Peter Hagerty, James Thackeray

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241840

KEYWORDS: Photoresist materials, Semiconducting wafers, Etching, Polymers, Lithography, Silicon, Photoresist developing, Deep ultraviolet, Head-mounted displays, Antireflective coatings

Read Abstract +

Proceedings Article | 9 June 1995 Paper

Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation

Marina Plat, William Brunsvold, Randolph Smith, Nicholas Eib, Christopher Lyons

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210348

KEYWORDS: Critical dimension metrology, Absorbance, Reflectivity, Absorption, Photoresist processing, Picture Archiving and Communication System, Silicon, Performance modeling, Thin films, Dysprosium

Read Abstract +

Proceedings Article | 9 June 1995 Paper

New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group

James Fahey, Will Conley, William Brunsvold, Dominic Yang, Wayne Moreau, George Jordhamo, Steve Pratt, Dale Crockatt, George Hefferon, Robert Wood

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210419

KEYWORDS: Diffusion, Polymers, Photoresist materials, Molecules, Deep ultraviolet, Osmium, Chemistry, Interfaces, Lithography, Contamination

Read Abstract +

Proceedings Article | 9 June 1995 Paper

Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography

Daniel Bucca, Ari Aviram, David Seeger, Will Conley, William Brunsvold

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210395

KEYWORDS: Photoresist materials, Picture Archiving and Communication System, Absorption, X-rays, Synchrotron radiation, X-ray lithography, Iodine, Radiation effects, Lithography, Opacity

Read Abstract +

Proceedings Article | 16 May 1994 Paper

Further improvements in CGR formulation and process

William Brunsvold, Will Conley, Jeffrey Gelorme, Ronald Nunes, Ratnam Sooriyakumaran, Steven Holmes, John Sturtevant

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175350

KEYWORDS: Semiconducting wafers, Reticles, Etching, Image processing, Excimer lasers, Materials processing, Manufacturing, Deep ultraviolet, Lithography, Imaging systems

Read Abstract +

Proceedings Article | 15 September 1993 Paper

Negative DUV photoresist for 16Mb-DRAM production and future generations

Will Conley, William Brunsvold, Richard Ferguson, Jeffrey Gelorme, Steven Holmes, Ronald Martino, Magda Petryniak, Paul Rabidoux, Ratnam Sooriyakumaran, John Sturtevant

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154744

KEYWORDS: Semiconducting wafers, Photoresist materials, Deep ultraviolet, Lithography, Logic, Manufacturing, Silicon, Etching, Photoresist developing, Ultraviolet radiation

Read Abstract +

Proceedings Article | 15 September 1993 Paper

Evaluation of a deep-UV bilayer resist for sub-half micron lithography

William Brunsvold, Kevin Stewart, Premlatha Jagannathan, Ratnam Sooriyakumaran, J. Parrill, Karl Muller, Harbans Sachdev

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154772

KEYWORDS: Semiconducting wafers, Etching, Silicon, Deep ultraviolet, Polymers, Excimer lasers, Printing, Lithography, Reactive ion etching, Photomasks

Read Abstract +

Proceedings Article | 1 June 1992 Paper

Novel DNQ PACs for high-resolution i-line lithography

William Brunsvold, Nicholas Eib, Christopher Lyons, Steve Miura, Marina Plat, Ralph Dammel, O. Evans, M. Rahman, Dinesh Khanna, Sangya Jain, Ping-Hung Lu, Stanley Ficner

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59778

KEYWORDS: Lithography, Picture Archiving and Communication System, Photoresist materials, Standards development, Absorbance, Absorption, Ultraviolet radiation, Transparency, Optical spheres, Chromophores

Read Abstract +

Proceedings Article | 1 June 1991 Paper

Nonmetallic acid generators for i-line and g-line chemically amplified resists

William Brunsvold, Warren Montgomery, Bao Hwang

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46385

KEYWORDS: Absorbance, Polymers, Chemically amplified resists, Deep ultraviolet, Near ultraviolet, Semiconducting wafers, Lithography, Ultraviolet radiation, Solids, Silicon

Read Abstract +

Proceedings Article | 1 June 1990 Open Access

1X deep-UV lithography with chemical amplification for 1-micron DRAM production

John Maltabes, Steven Holmes, James Morrow, Roger Barr, Mark Hakey, Gregg Reynolds, William Brunsvold, C. Grant Willson, Nicholas Clecak, Scott MacDonald, Hiroshi Ito

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20090

KEYWORDS: Deep ultraviolet, Semiconducting wafers, Image processing, Lithography, Manufacturing, Photoresist processing, Industrial chemicals, Radon, Photomasks, Chemically amplified resists

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 1 June 1990 Paper

Sensitivity enhancers for chemically amplified resists

William Brunsvold, Ranee Kwong, Warren Montgomery, Wayne Moreau, Harbans Sachdev, Kevin Welsh

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20084

KEYWORDS: Polymers, Deep ultraviolet, Chemically amplified resists, Photolysis, X-rays, Hydrogen, Absorbance, Chemical species, Semiconducting wafers, X-ray imaging

Read Abstract +

Showing 5 of 18 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years