Focus and exposure dose determination using stepper alignment

Peter Dirksen; Rudy J. M. Pellens; Casper A. H. Juffermans; Marijan E. Reuhman-Huisken; Hans van der Laan

doi:10.1117/12.240941

7 June 1996 Focus and exposure dose determination using stepper alignment

Peter Dirksen, Rudy J. M. Pellens, Casper A. H. Juffermans, Marijan E. Reuhman-Huisken, Hans van der Laan

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240941
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The standard ASML alignment system in combination with modified marks is used to determine the primary imaging parameters of the stepper: focus and exposure dose. The method uses a standard chromium on glass reticle. The paper discusses system calibration and feedforward process control in production. A lens qualification at the specified resolution and swing curves are shown. The exposure dose measurements are compared with dose to clear measurements. The theory for optimizing the mark layout is presented.

Citation Download Citation

Peter Dirksen, Rudy J. M. Pellens, Casper A. H. Juffermans, Marijan E. Reuhman-Huisken, and Hans van der Laan "Focus and exposure dose determination using stepper alignment", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240941

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