Antireflection and opaque coating film materials for Ta/SiC x-ray masks

Yoshihisa Iba; Fumiaki Kumasaka; Hajime Aoyama; Takao Taguchi; Masaki Yamabe

doi:10.1117/12.277257

28 July 1997 Antireflection and opaque coating film materials for Ta/SiC x-ray masks

Yoshihisa Iba, Fumiaki Kumasaka, Hajime Aoyama, Takao Taguchi, Masaki Yamabe

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277257
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

An opaque film coating and an anti-reflection (AR) film coating of x-ray masks are essential in order to get a higher alignment accuracy in optical heterodyne alignment systems. Not only the optical characteristics of the films, but also the stress and the durability in cleaning processes are important issues for the films. We investigated various materials from the viewpoints of the refractive index-matching with SiC, stress controllability and stability to a strong acid, an we have developed a material suitable for use with a Ta/SiC x-ray mask. We found that a sputtered Zr and Si compound oxide film fulfills the requirements of the AR film. We also found that a sputtered Ta film can be used as the opaque film, and we enhanced the diffraction efficiency of a mask mark by coating the AR film before coating the Ta opaque film on the mask mark.

Citation Download Citation

Yoshihisa Iba, Fumiaki Kumasaka, Hajime Aoyama, Takao Taguchi, and Masaki Yamabe "Antireflection and opaque coating film materials for Ta/SiC x-ray masks", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277257

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