Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL

Sergey V. Babin; Peter Hudek; Ivan Kostic; Igor Yu. Kuzmin

doi:10.1117/12.309629

5 June 1998 Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL

Sergey V. Babin, Peter Hudek, Ivan Kostic, Igor Yu. Kuzmin

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309629
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

A method was developed to separate and quantitatively characterize a contribution of resist heating and proximity effects into CD-variation in electron-beam lithography. An experimental and theoretical study of these two effects were done using a 30 kV variably shaped beam system. TEMPTATION software tool was used to simulate temperature rise during electron exposures. Good agreement of experimental results and simulated data was found. A method was developed to measure proximity function which is free of resist heating influence.

Citation Download Citation

Sergey V. Babin, Peter Hudek, Ivan Kostic, and Igor Yu. Kuzmin "Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309629

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