Dr. Sergey Babin Profile

Dr. Sergey Babin

President at Abeam Technologies Inc

SPIE Involvement:

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Websites:

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Publications (77)

Proceedings Article | 21 August 2020 Paper

Paper

Binary pseudorandom array test standard optimized for characterization of large field-of-view optical interferometers

Valeriy Yashchuk, Sergey Babin, Stefano Cabrini, Weilun Chao, Ulf Griesmann, Ian Lacey, Stefano Marchesini, Keiko Munechika, Carlos Pina-Hernandez, Allen Roginsky

Proceedings Volume 11490, 114900W (2020) https://doi.org/10.1117/12.2568309

KEYWORDS: Modulation transfer functions, Fizeau interferometers, Calibration, Light sources, Interferometers, Spatial frequencies, Metrology, Zoom lenses, Binary data

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Proceedings Article | 25 March 2019 Paper

Paper

The hidden energy tail of low energy electrons in EUV lithography

Roberto Fallica, Seyed Javid Rezvani, Stefano Nannarone, Sergei Borisov, Danilo De Simone, Sergey Babin, Gian Lorusso, Geert Vandenberghe

Proceedings Volume 10960, 1096009 (2019) https://doi.org/10.1117/12.2514998

KEYWORDS: Electrons, Photoresist materials, Extreme ultraviolet lithography, Polymers, Scattering, Extreme ultraviolet, Sensors, Spectroscopy, Data modeling, Lithography

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Proceedings Article | 18 August 2018 Paper

Paper

Characterization and operation optimization of large aperture optical interferometers using binary pseudorandom array test standards

Valeriy Yashchuk, Sergey Babin, Stefano Cabrini, Ulf Griesmann, Ian Lacey, Keiko Munechika, Carlos Pina-Hernandez, Quandou Wang

Proceedings Volume 10749, 107490R (2018) https://doi.org/10.1117/12.2322011

KEYWORDS: Interferometers, Fizeau interferometers, Spatial frequencies, Modulation transfer functions, Visualization, Monochromatic aberrations

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Proceedings Article | 28 March 2018 Paper

Paper

Overlay of multiframe SEM images including nonlinear field distortions

S. Babin, S. Borisov, I. Ivonin, S. Nakazawa, Y. Yamazaki

Proceedings Volume 10585, 105852B (2018) https://doi.org/10.1117/12.2299847

KEYWORDS: Scanning electron microscopy, Signal to noise ratio, Image quality, Imaging systems, Optical resolution, Semiconducting wafers, Interference (communication), Image display

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Proceedings Article | 19 March 2018 Presentation

Presentation

Extraction of CDs and side wall angles from top down SEM images of double layered structures (Conference Presentation)

Sergey Babin, Leia Guo, Igor Ivonin, Yi Huang

Proceedings Volume 10585, 105850K (2018) https://doi.org/10.1117/12.2298389

KEYWORDS: Cadmium sulfide, Scanning electron microscopy, Etching, Transmission electron microscopy, Metrology, Semiconductor manufacturing, Critical dimension metrology, Image processing, Software development

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Proceedings Article | 19 March 2018 Presentation

Presentation

High repeatability CD-SEM metrology of disk drive writer and extraction of SWA (Conference Presentation)

Narender Rana, Anhhuy Ngo, Chester Chien, Sergey Babin, Igor Ivonin

Proceedings Volume 10585, 1058516 (2018) https://doi.org/10.1117/12.2301328

KEYWORDS: Metrology, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Image processing software, Semiconductor manufacturing, 3D metrology, Process control, Transmission electron microscopy, Manufacturing

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In contrast to semiconductor manufacturing where features are mostly lines or contact holes, the disk drive reader has a complex, nonlinear 3D geometry. Metrology of such geometries is challenging; especially with regard to repeatability of measurements. New methods were needed to keep up with production requirements for metrology regarding uncertainty of critical dimensions (CD). We report a new method developed for CD metrology of the disk drive writer pole. The method demonstrated improved uncertainties compared to the regularly used CD-SEM algorithms and also has capability for side wall angle (SWA) metrology for process control. The method utilizes multiple steps: a) extract contours from SEM images, b) identify exact locations on a curvilinear feature where CD should be measured, and c) provide CD measurements at these locations. SEM images from a variety of production wafers were used for evaluation of the developed method. Multiple series of SEM images were processed using a software utilizing advanced algorithms without using regular brightness threshold CD-SEM methodologies. It was found that CD repeatability was improved by a factor of three compared to the results of the regular threshold based CD-SEM method. TEM imaging is used to measure side wall angle; it takes a lot of efforts for sample preparation and the feedback is slow. If extraction of SWA is possible from top down SEM images it would provide instant feedback to manufacturing and reduce cost. Monte Carlo simulations were used to understand the sensitivity of SWA to the trench CD and depth. Height of features was measured using AFM. A method to extract SWA from top down images was developed. Numerous SEM images were processed; results were compared to experiment and analyzed. It was shown that the 3-sigma repeatability of SWA measurement was 0.15 degree. It was also found that the left and the right SWA were different on multiple wafers, the results were very consistent from one image series to another one, at the same time the SWA difference between the left and right walls was considerably larger than the uncertainty of SWA measurement.

Proceedings Article | 13 March 2018 Presentation + Paper

Presentation + Paper

Modeling of electron-specimen interaction in scanning electron microscope for e-beam metrology and inspection: challenges and perspectives

Makoto Suzuki, Toshimasa Kameda, Ayumi Doi, Sergey Borisov, Sergey Babin

Proceedings Volume 10585, 1058517 (2018) https://doi.org/10.1117/12.2301383

KEYWORDS: Scanning electron microscopy, Monte Carlo methods, Scattering, Sensors, Diffraction, Copper, Computer simulations

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Proceedings Article | 28 April 2017 Presentation

Presentation

CD-SEM metrology and OPC modeling for 2D patterning in advanced technology nodes (Conference Presentation)

Thomas Wallow, Chen Zhang, Anita Fumar-Pici, Jun Chen, Bart Laenens, Christopher Spence, David Rio, Paul van Adrichem, Harm Dillen, Jing Wang, Peng-Cheng Yang, Werner Gillijns, Patrick Jaenen, Frieda van Roey, Jeroen van de Kerkhove, Sergey Babin

Proceedings Volume 10145, 101451Q (2017) https://doi.org/10.1117/12.2260443

KEYWORDS: Metrology, Optical proximity correction, Data modeling, Optical lithography, Signal to noise ratio, OLE for process control, Instrument modeling, Image analysis, Calibration, Metals

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In the course of assessing OPC compact modeling capabilities and future requirements, we chose to investigate the interface between CD-SEM metrology methods and OPC modeling in some detail. Two linked observations motivated our study: 1) OPC modeling is, in principle, agnostic of metrology methods and best practice implementation. 2) Metrology teams across the industry use a wide variety of equipment, hardware settings, and image/data analysis methods to generate the large volumes of CD-SEM measurement data that are required for OPC in advanced technology nodes. Initial analyses led to the conclusion that many independent best practice metrology choices based on systematic study as well as accumulated institutional knowledge and experience can be reasonably made. Furthermore, these choices can result in substantial variations in measurement of otherwise identical model calibration and verification patterns. We will describe several experimental 2D test cases (i.e., metal, via/cut layers) that examine how systematic changes in metrology practice impact both the metrology data itself and the resulting full chip compact model behavior. Assessment of specific methodology choices will include: • CD-SEM hardware configurations and settings: these may range from SEM beam conditions (voltage, current, etc.,) to magnification, to frame integration optimizations that balance signal-to-noise vs. resist damage. • Image and measurement optimization: these may include choice of smoothing filters for noise suppression, threshold settings, etc. • Pattern measurement methodologies: these may include sampling strategies, CD- and contour- based approaches, and various strategies to optimize the measurement of complex 2D shapes. In addition, we will present conceptual frameworks and experimental methods that allow practitioners of OPC metrology to assess impacts of metrology best practice choices on model behavior. Finally, we will also assess requirements posed by node scaling on OPC model accuracy, and evaluate potential consequences for CD-SEM metrology capabilities and practices.

Proceedings Article | 28 March 2017 Presentation + Paper

Presentation + Paper

1.5nm fabrication of test patterns for characterization of metrological systems

S. Babin, N. Bouet, S. Cabrini, G. Calafiore, R. Conley, G. Gevorkyan, K. Munechika, A. Vladár, V. Yashchuk

Proceedings Volume 10145, 1014518 (2017) https://doi.org/10.1117/12.2257624

KEYWORDS: Metrology, Imaging systems, Contrast transfer function, Software development, Scanning electron microscopy, Semiconductors, Silicon, Diffraction, Spatial frequencies, Transmission electron microscopy, Optical fabrication, Fabrication

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Proceedings Article | 28 March 2017 Presentation + Paper

Presentation + Paper

SEM image prediction based on modeling of electron-solid interaction

Toshimasa Kameda, Satoshi Takada, Makoto Suzuki, Toshiyuki Yokosuka, Sergey Borisov, Sergey Babin

Proceedings Volume 10145, 101451I (2017) https://doi.org/10.1117/12.2257661

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Image processing, Crystals, Electrons, Metrology, Inspection, Manufacturing, Scattering, Silica, Selenium, Laser scattering, Semiconductors

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Proceedings Article | 4 October 2016 Paper

Paper

Correction of placement error in EBL using model based method

Sergey Babin, Sergey Borisov, Vladimir Militsin, Tadashi Komagata, Tetsuro Wakatsuki

Proceedings Volume 9985, 998513 (2016) https://doi.org/10.1117/12.2256908

KEYWORDS: Calibration, Electron beam lithography, Photomasks, Electron beams, Data corrections, Data modeling, Physics, Systems modeling, Monte Carlo methods, Human-machine interfaces

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Proceedings Article | 10 May 2016 Paper

Paper

Model based correction of placement error in EBL and its verification

Sergey Babin, Sergey Borisov, Vladimir Militsin, Tadashi Komagata, Tetsuro Wakatsuki

Proceedings Volume 9984, 998406 (2016) https://doi.org/10.1117/12.2244793

KEYWORDS: Calibration, Electron beam lithography, Photomasks, Electrons, Data corrections, Electron beams, Physics, Monte Carlo methods, Systems modeling, Distortion

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Proceedings Article | 1 September 2015 Paper

Paper

Binary pseudorandom test standard to determine the modulation transfer function of optical microscopes

Ian Lacey, Erik Anderson, Nikolay Artemiev, Sergey Babin, Stefano Cabrini, Guiseppe Calafiore, Elaine Chan, Wayne McKinney, Christophe Peroz, Peter Takacs, Valeriy Yashchuk

Proceedings Volume 9576, 957608 (2015) https://doi.org/10.1117/12.2185191

KEYWORDS: Modulation transfer functions, Binary data, Calibration, Spatial frequencies, Standards development, Optical microscopes, Silicon, Error analysis, Sensors, Optical fabrication

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Proceedings Article | 19 March 2015 Paper

Paper

High sensitivity tracking of CD-SEM performance: QSEM

S. Babin, Jaffee Huang, P. Yushmanov

Proceedings Volume 9424, 942427 (2015) https://doi.org/10.1117/12.2086069

KEYWORDS: Scanning electron microscopy, Image quality, Semiconducting wafers, Metrology, Cadmium sulfide, Image analysis, Critical dimension metrology, Software development, Line edge roughness, Image processing

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Proceedings Article | 19 March 2015 Paper

Paper

Fast analytical modeling of SEM images at a high level of accuracy

S. Babin, S. Borisov, V. Trifonenkov

Proceedings Volume 9424, 94240I (2015) https://doi.org/10.1117/12.2086072

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Sensors, Optical simulations, Scattering, Optical lithography, Lithography, 3D modeling, 3D image processing, Silicon

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Proceedings Article | 1 October 2013 Paper

Paper

Simulation and correction of resist charging due to fogging in electron-beam lithography

Sergey Babin, Sergey Borisov, Vladimir Militsin, Elena Patyukova

Proceedings Volume 8880, 888019 (2013) https://doi.org/10.1117/12.2032177

KEYWORDS: Monte Carlo methods, Electron beam lithography, Objectives, Scattering, Electrodes, Critical dimension metrology, Optical spheres, Lithography, Optical simulations, Scanning electron microscopy

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Proceedings Article | 1 October 2013 Paper

Paper

Dose variation and charging due to fogging in electron beam lithography: simulations using CHARIOT Monte Carlo software

Sergey Babin, Sergey Borisov, Elena Patyukova

Proceedings Volume 8886, 88860E (2013) https://doi.org/10.1117/12.2032414

KEYWORDS: Monte Carlo methods, Electron beam lithography, Objectives, Scattering, Optical simulations, Critical dimension metrology, Electrodes, Semiconductors, Software development, Optical spheres

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Proceedings Article | 30 June 2012 Paper

Paper

Placement error due to charging in EBL: experimental verification of a new correction model

Sergey Babin, Sergey Borisov, Yasuki Kimura, Kenji Kono, Vladimir Militsin, Ryuuji Yamamoto

Proceedings Volume 8441, 844112 (2012) https://doi.org/10.1117/12.978924

KEYWORDS: Electron beam lithography, Photomasks, Data modeling, Calibration, Double patterning technology, Software development, Mask making, Electron beams, Distortion, Etching

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Proceedings Article | 30 June 2012 Paper

Paper

CD-Metrology of EUV masks in the presence of charging: measurement and simulation

Sergey Babin, Sergey Borisov, Hidemitsu Hakii, Yasushi Nishiyama, Isao Yonekura

Proceedings Volume 8441, 844108 (2012) https://doi.org/10.1117/12.999462

KEYWORDS: Monte Carlo methods, Extreme ultraviolet, Scanning electron microscopy, Photomasks, Sensors, Metrology, Oxides, Signal detection, Multilayers, Electron beams

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Proceedings Article | 5 April 2012 Paper

Paper

CD-SEM and e-beam defect inspection of high-aspect ratio contact holes: measurement and simulation of precharge

S. Babin, S Borisov, G. Kwon, C. H. Lee, J. H. Oh, D. Y. Mun, H. W. Yoo

Proceedings Volume 8324, 832428 (2012) https://doi.org/10.1117/12.916441

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Defect inspection, Metrology, Particles, Sensors, 3D modeling, Inspection, Oxides, Optical simulations

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Proceedings Article | 3 April 2012 Paper

Paper

SEM metrology on bit patterned media nanoimprint template: issues and improvements

Justin Hwu, Sergey Babin, Peter Yushmanov

Proceedings Volume 8324, 83241F (2012) https://doi.org/10.1117/12.918064

KEYWORDS: Scanning electron microscopy, Metrology, Image processing, Nanoimprint lithography, Image analysis, Transmission electron microscopy, Statistical analysis, Signal processing, Process modeling, Beam propagation method

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Proceedings Article | 3 April 2012 Paper

Paper

Challenges of SEM metrology at sub-10nm linewidth

Sergey Babin, Sergey Borisov, Christophe Peroz, Peter Yushmanov

Proceedings Volume 8324, 83240T (2012) https://doi.org/10.1117/12.916679

KEYWORDS: Scanning electron microscopy, Metrology, Monte Carlo methods, Image analysis, Image quality, Cadmium, Sensors, Line width roughness, Critical dimension metrology, Line edge roughness

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Proceedings Article | 9 June 2010 Paper

Paper

Comprehensive simulation of SEM images taking into account local and global electromagnetic fields

Sergey Babin, Sergey Borisov, Hiroyuki Ito, Andrei Ivanchikov, Dmitri Matison, Vladimir Militsin, Makoto Suzuki

Proceedings Volume 7729, 77290W (2010) https://doi.org/10.1117/12.859951

KEYWORDS: Scanning electron microscopy, Monte Carlo methods, Electrodes, Silica, Electromagnetism, Sensors, Scattering, Carbon, Nanofibers, 3D modeling

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Proceedings Article | 3 June 2010 Paper

Paper

Optimizing the detector configuration for SEM topographic contrast by using a Monte Carlo simulation

Makoto Suzuki, Sergey Borisov, Sergey Babin, Hiroyuki Ito

Proceedings Volume 7729, 772910 (2010) https://doi.org/10.1117/12.859775

KEYWORDS: Sensors, Monte Carlo methods, Scanning electron microscopy, Signal detection, Signal processing, Interference (communication), Image sensors, 3D modeling, Scattering, Magnetism

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Proceedings Article | 27 May 2010 Paper

Paper

Evolution of etch profile and CD variation in maskmaking and SPT: simulations using TRAVIT software

Sergey Babin, Konstantin Bay

Proceedings Volume 7748, 774813 (2010) https://doi.org/10.1117/12.868147

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Photomasks, Anisotropic etching, Cadmium, Optical lithography, Tolerancing, Microelectromechanical systems, Photoresist processing

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Proceedings Article | 2 April 2010 Paper

Paper

Application of analytic SEM to CD metrology at nanometer scale

Justin Hwu, Sergey Babin, Konstantin Bay

Proceedings Volume 7638, 76383O (2010) https://doi.org/10.1117/12.851106

KEYWORDS: Scanning electron microscopy, Image processing, Metrology, Transmission electron microscopy, Line width roughness, Image analysis, Monte Carlo methods, Process modeling, Critical dimension metrology, Quartz

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Proceedings Article | 2 April 2010 Paper

Paper

Fabrication of a new BEAMETR chip for automatic electron beam size measurement

S. Babin, K. Bay, S. Cabrini, S. Dhuey, B. Harteneck, M. Machin, C. Peroz

Proceedings Volume 7638, 76383N (2010) https://doi.org/10.1117/12.850967

KEYWORDS: Electron beams, Optical testing, Scanning electron microscopy, Metrology, Electron beam lithography, Beam shaping, Image analysis, Polymethylmethacrylate, Metals, Fabrication

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Proceedings Article | 2 April 2010 Paper

Paper

Model-based analysis of SEM images to automatically extract linewidth, edge roughness, and wall angle

S. Babin, K. Bay, M. Machin

Proceedings Volume 7638, 76380R (2010) https://doi.org/10.1117/12.848435

KEYWORDS: Scanning electron microscopy, Image analysis, Edge roughness, Cadmium, Line width roughness, Critical dimension metrology, Line edge roughness, Transmission electron microscopy, Metrology, Scattering

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Proceedings Article | 4 March 2010 Paper

Paper

Modeling of CD and placement error in multi-spacer patterning technology

S. Babin, K. Bay

Proceedings Volume 7640, 764021 (2010) https://doi.org/10.1117/12.850972

KEYWORDS: Etching, Optical lithography, Photoresist processing, Critical dimension metrology, Dry etching, Cadmium, Anisotropic etching, Photomasks, Lithography, Fabrication

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Proceedings Article | 23 September 2009 Paper

Paper

SEM CD metrology on nanoimprint template: an analytical SEM approach

Justin Hwu, Sergey Babin, Lorena Page, Alex Danilevsky, Andy Self, Kazuhiro Ueda, Shunzuke Koshihara, Koichi Wago, Kim Lee, David Kuo

Proceedings Volume 7488, 74881W (2009) https://doi.org/10.1117/12.830699

KEYWORDS: Scanning electron microscopy, Image processing, Image analysis, Metrology, Line width roughness, Critical dimension metrology, Monte Carlo methods, Transmission electron microscopy, Quartz, Process modeling

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Critical dimension metrology is the most needed feedback in nanofabrication and automatic CDSEM-based methods are by far the industrial standard for its well-established methodology and ease of programming and flexibility in measurement setup and operation. The dimensional measurements from SEMs consist of two steps, the first being the pixel based electron emission signal intensity profile generation and the second being the algorithm treatment on the generated intensity profile for the dimension determination. However, SEM metrology involves uncertainty of the measurement in the signal processing step, because the SEM signal formation is an extremely complex process depending on the pattern geometry, materials, detector setup, and beam voltage. Analytical SEMs are even less optimized for the task of quantitative metrology, especially at the CD ranging below 100 nm. In this work, we used an analytical SEM for CD metrology applications on quartz nanoimprint template from the perspective that only analytical SEM is accessible. The machine was tuned and beam characterization was done first to find the best reasonable condition for consistent manual operation using BEAMETR beam measurement pattern and software. The optimized beam condition set was then used for image collection on pitch pattern quartz template and the measurements were done using regular imaging processing and physical model based processing tool myCD. In order to discuss the spot size on the scan signal and the resulting influence on CD measurements, we used CHARIOT simulation software for simulated intensity profile as demonstration. The quartz template was then measured through a mask CDSEM for final data comparison. Selected sites were cross sectioned to reveal profile information as metrology comparison reference. Through our exercise, the metrology capability and fundamental limitation of analytical SEM operation with regular imaging processing was identified and the improvement using the physical modeling imaging process was verified.

Proceedings Article | 22 May 2009 Paper

Paper

Modeling of charge and discharge in scanning electron microscopy

S. Babin, S. Borisov, A. Ivanchikov

Proceedings Volume 7378, 737818 (2009) https://doi.org/10.1117/12.828575

KEYWORDS: Electrons, Scanning electron microscopy, Monte Carlo methods, Scattering, 3D modeling, Sensors, Electron beams, 3D acquisition, Laser scattering, Mathematical modeling

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Proceedings Article | 24 March 2009 Paper

Paper

Restoring pattern CD and cross-section using scatterometry: various approaches

S. Babin, L. Doskolovich, E. Kadomina, I. Kadomin, S. Volotovskiy

Proceedings Volume 7272, 727243 (2009) https://doi.org/10.1117/12.816436

KEYWORDS: Scatterometry, Neural networks, Error analysis, Neurons, Polarization, Inverse problems, Diffraction, Critical dimension metrology, Light scattering, Cadmium

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Proceedings Article | 24 March 2009 Paper

Paper

Time dependence of SEM signal due to charging: measurements and simulation using Monte Carlo software

H. Abe, S. Babin, S. Borisov, A. Hamaguchi, A. Ivanchikov, M. Kadowaki, Y. Yamazaki

Proceedings Volume 7272, 727248 (2009) https://doi.org/10.1117/12.816899

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Silica, Silicon, Electron beams, Dielectrics, Defect inspection, Optical simulations, Sensors, 3D modeling

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Proceedings Article | 24 March 2009 Paper

Paper

SCATT: software to model scatterometry using the rigorous electromagnetic theory

S. Babin, L. Doskolovich, Y. Ishibashi, A. Ivanchikov, N. Kazanskiy, I. Kadomin, T. Mikami, Y. Yamazaki

Proceedings Volume 7272, 72723X (2009) https://doi.org/10.1117/12.816904

KEYWORDS: Scatterometry, Systems modeling, Software development, Diffraction, Diffraction gratings, Silicon, 3D modeling, Transistors, Metals, Electromagnetic theory

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Proceedings Article | 24 March 2009 Paper

Paper

Investigation of factors causing difference between simulation and real SEM image

M. Kadowaki, A. Hamaguchi, H. Abe, Y. Yamazaki, S. Borisov, A. Ivanchikov, S. Babin

Proceedings Volume 7272, 72723I (2009) https://doi.org/10.1117/12.814036

KEYWORDS: Oxides, Scanning electron microscopy, Monte Carlo methods, Silicon, Silica, Wet etching, Inspection, Optical spheres, Electron beams, Data acquisition

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Proceedings Article | 16 April 2008 Paper

Paper

Automated metrology for SEM calibration and CD line measurements using image analysis and SEM modeling methods

Vitali Khvatkov, Vasily Alievski, Radi Kadushnikov, Sergey Babin

Proceedings Volume 6922, 69222N (2008) https://doi.org/10.1117/12.774517

KEYWORDS: Scanning electron microscopy, Image processing, Critical dimension metrology, Metrology, Data modeling, Image analysis, Statistical analysis, Calibration, Signal detection, Image segmentation

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Proceedings Article | 24 March 2008 Paper

Paper

Calibration of CD-SEM: moving from relative to absolute measurements

S. Babin, S. Borisov, A. Ivanchikov, I. Ruzavin

Proceedings Volume 6922, 69222M (2008) https://doi.org/10.1117/12.775104

KEYWORDS: Scanning electron microscopy, Monte Carlo methods, Sensors, Scattering, Calibration, Signal detection, 3D modeling, Optical simulations, Aluminum, Copper

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Proceedings Article | 20 October 2006 Paper

Paper

Propagation of resist heating mask error to wafer level

S. Babin, Linard Karklin

Proceedings Volume 6349, 634950 (2006) https://doi.org/10.1117/12.690533

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Electron beam lithography, Manufacturing, Metals, Photoresist processing, Computer simulations, Electronic design automation, Design for manufacturing

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As technology is approaching 45 nm and below the IC industry is experiencing a severe product yield hit due to rapidly shrinking process windows and unavoidable manufacturing process variations. Current EDA tools are unable by their nature to deliver optimized and process-centered designs that call for 'post design' localized layout optimization DFM tools. To evaluate the impact of different manufacturing process variations on final product it is important to trace and evaluate all errors through design to manufacturing flow. Photo mask is one of the critical parts of this flow, and special attention should be paid to photo mask manufacturing process and especially to mask tight CD control. Electron beam lithography (EBL) is a major technique which is used for fabrication of high-end photo masks. During the writing process, resist heating is one of the sources for mask CD variations. Electron energy is released in the mask body mainly as heat, leading to significant temperature fluctuations in local areas. The temperature fluctuations cause changes in resist sensitivity, which in turn leads to CD variations. These CD variations depend on mask writing speed, order of exposure, pattern density and its distribution. Recent measurements revealed up to 45 nm CD variation on the mask when using ZEP resist. The resist heating problem with CAR resists is significantly smaller compared to other types of resists. This is partially due to higher resist sensitivity and the lower exposure dose required. However, there is no data yet showing CD errors on the wafer induced by CAR resist heating on the mask. This effect can be amplified by high MEEF values and should be carefully evaluated at 45nm and below technology nodes where tight CD control is required. In this paper, we simulated CD variation on the mask due to resist heating; then a mask pattern with the heating error was transferred onto the wafer. So, a CD error on the wafer was evaluated subject to only one term of the mask error budget - the resist heating CD error. In simulation of exposure using a stepper, variable MEEF was considered.

Proceedings Article | 20 May 2006 Paper

Paper

Simulation of dry etch profile dynamics and CD variation due to microloading

S. Babin, K. Bay, S. Okulovsky

Proceedings Volume 6283, 62831R (2006) https://doi.org/10.1117/12.681753

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Quartz, Anisotropic etching, Photomasks, Isotropic etching, Cadmium, Software development, Photoresist processing

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Proceedings Article | 20 May 2006 Paper

Paper

EBL resist heating error and its correction

Sergey Babin, Igor Kuzmin

Proceedings Volume 6283, 62831Q (2006) https://doi.org/10.1117/12.681752

KEYWORDS: Critical dimension metrology, Electron beam lithography, Modulation, Photomasks, Electrons, Lithography, Cadmium, Temperature metrology, Error analysis, Software development

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Proceedings Article | 25 March 2006 Paper

Paper

Modeling of linewidth measurement in SEMs using advanced Monte Carlo software

S. Babin, S. Borisov, A. Ivanchikov, I. Ruzavin

Proceedings Volume 6152, 61524P (2006) https://doi.org/10.1117/12.673532

KEYWORDS: Scanning electron microscopy, Monte Carlo methods, Edge detection, Detection and tracking algorithms, Silicon, Calibration, 3D modeling, Scattering, Signal detection, Data modeling

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Proceedings Article | 28 June 2005 Paper

Paper

Prediction of etch profile and CD variation due to dry etch using TRAVIT software tool

S. Babin, K. Bay, S. Okulovsky

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617070

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Monte Carlo methods, Photomasks, Metrology, Inspection, Cadmium, Device simulation, Plasma

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Proceedings Article | 16 June 2005 Paper

Paper

TRAVIT: software tool to simulate dry etch in maskmaking

S. Babin, K. Bay, S. Okulovsky

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637291

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Monte Carlo methods, Cadmium sulfide, Computer simulations, Wet etching, Anisotropic etching, Isotropic etching, Photomasks

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Proceedings Article | 6 December 2004 Paper

Paper

Software to simulate dry etch in photomask fabrication

Sergey Babin, Konstantin Bay, Sergey Okulovsky

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.575426

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Photomasks, Isotropic etching, Device simulation, Software development, Tolerancing, Plasma, Chemistry

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Proceedings Article | 6 December 2004 Paper

Paper

Writing strategy and electron-beam system with an arbitrarily shaped beam

Sergey Babin

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568677

KEYWORDS: Beam shaping, Optical proximity correction, Vestigial sideband modulation, Photomasks, Electron beam lithography, Semiconducting wafers, Raster graphics, Edge roughness, Imaging systems, Magnetism

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Proceedings Article | 28 August 2003 Paper

Paper

Resist heating dependence on subfield scheduling in 50-kV electron beam maskmaking

Sergey Babin, Andrew Kahng, Ion Mandoiu, Swamy Muddu

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.512442

KEYWORDS: Critical dimension metrology, Photomasks, Distortion, Electron beams, Electron beam lithography, Semiconductors, Computer simulations, Ions, Electrochemical etching, Lanthanum

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Proceedings Article | 14 August 2003 Paper

Paper

Digital planar holography and multiplexer/demultiplexer with discrete dispersion

Vladimir Yankov, Sergey Babin, Igor Ivonin, Alexander Goltsov, Anatolii Morozov, Leonid Polonskiy, Michael Spector, Andrei Talapov, Ernst Kley, Holger Schmidt, Robert Dahlgren

Proceedings Volume 5246, (2003) https://doi.org/10.1117/12.511426

KEYWORDS: Holograms, Digital holography, Planar waveguides, Dispersion, Holography, Photonics, Photonic integrated circuits, Refractive index, Photonic crystals, Volume holography

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Proceedings Article | 17 June 2003 Paper

Paper

Photonic bandgap quasi-crystals for integrated WDM devices

Vladimir Yankov, Sergey Babin, Igor Ivonin, Alexander Goltsov, Anatolii Morozov, Leonid Polonskiy, Michael Spector, Andrei Talapov, Ernst-Bernhard Kley, Holger Schmidt, Robert Dahlgren

Proceedings Volume 4989, (2003) https://doi.org/10.1117/12.488214

KEYWORDS: Planar waveguides, Fiber Bragg gratings, Wavelength division multiplexing, Mirrors, Manufacturing, Infrared cameras, Superposition, Volume holography, Lithography, Binary data

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Proceedings Article | 16 June 2003 Paper

Paper

Subfield scheduling for throughput maximization in electron-beam photomask fabrication

Sergey Babin, Andrew Kahng, Ion Mandoiu, Swamy Muddu

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484981

KEYWORDS: Photomasks, Critical dimension metrology, Distortion, Electron beams, Vestigial sideband modulation, Semiconductors, Mask making, Distance measurement, Ions, Electrochemical etching

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Proceedings Article | 16 June 2003 Paper

Paper

Software tool for advanced Monte Carlo simulation of electron scattering in EBL and SEM: CHARIOT

Sergey Babin, S. Borisov, E. Cheremukhin, Eugene Grachev, V. Korol, L. Ocola

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504568

KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Sensors, Signal detection, Scattering, Electron beam lithography, Plasmons, Software development, Energy transfer, Semiconducting wafers

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Proceedings Article | 11 March 2002 Paper

Paper

Throughput optimization of electron-beam lithography in photomask fabrication regarding acceptable accuracy of critical dimensions

Sergey Babin, Igor Kuzmin

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458333

KEYWORDS: Critical dimension metrology, Photomasks, Lithography, Electron beam lithography, Monte Carlo methods, Beam shaping, Electron beams, Software development, Quartz, Computer simulations

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Proceedings Article | 21 July 2000 Paper

Paper

Initial benchmarking of a new electron-beam raster pattern generator for 130-100 nm maskmaking

Charles Sauer, Frank Abboud, Sergey Babin, Varoujan Chakarian, Abe Ghanbari, Robert Innes, David Trost, Frederick Raymond

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390065

KEYWORDS: Photomasks, Lithography, Raster graphics, Critical dimension metrology, Photoresist processing, Control systems, Scattering, Modulation, Reticles, Electron beam lithography

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Proceedings Article | 30 December 1999 Paper

Paper

System architecture choices for an advanced mask writer (100 to 130 nm)

Varoujan Chakarian, Frederick Raymond, Charles Sauer, Sergey Babin, Robert Innes, Allan Sagle, Ulrich Hofmann, Bassam Shamoun, David Trost, Abe Ghanbari, Frank Abboud

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373318

KEYWORDS: Vestigial sideband modulation, Photomasks, Raster graphics, Lithography, Electron beam lithography, Optical proximity correction, Control systems, RGB color model, Photoresist processing, Reticles

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Proceedings Article | 25 August 1999 Paper

Paper

Design considerations for an electron-beam pattern generator for the 130-nm generation of masks

Frank Abboud, Sergey Babin, Varoujan Chakarian, Abe Ghanbari, Robert Innes, Frederick Raymond, Allan Sagle, Charles Sauer

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360239

KEYWORDS: Photoresist processing, Photomasks, Critical dimension metrology, Raster graphics, Vestigial sideband modulation, Compact discs, Monte Carlo methods, Lithography, Dry etching, Manufacturing

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Proceedings Article | 18 December 1998 Paper

Paper

Comparison of writing strategies subject to resist heating

Sergey Babin

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332875

KEYWORDS: Raster graphics, Vestigial sideband modulation, Critical dimension metrology, Temperature metrology, Electron beam lithography, Monte Carlo methods, Photomasks, Distortion, Electron beams, Software development

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Proceedings Article | 5 June 1998 Paper

Paper

Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL

Sergey Babin, Peter Hudek, Ivan Kostic, Igor Kuzmin

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309629

KEYWORDS: Electron beam lithography, Temperature metrology, Lithography, Critical dimension metrology, Beam shaping, Computing systems, Distortion, Photomasks, Photoresist processing, Electron beams

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SPIE Journal Paper | 1 September 1997

Measuring the proximity effects in laser pattern generation

Sergey Babin

OE, Vol. 36, Issue 09, (September 1997) https://doi.org/10.1117/12.10.1117/1.601479

KEYWORDS: Photoresist materials, Photomasks, Lithography, Point spread functions, Electron beam lithography, Spatial resolution, Light scattering, Laser development, Manufacturing, Laser energy

Proceedings Article | 7 July 1997 Paper

Paper

Simulation of resist heating in electron-beam lithography

Sergey Babin, Igor Kuzmin

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275801

KEYWORDS: Electron beam lithography, Beam shaping, Electron beams, Software development, Glasses, Mathematical modeling, Gaussian beams, Photoresist processing, Lithography, Diffusion

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Proceedings Article | 7 July 1997 Paper

Paper

CD variation in 30-kV EBL due to resist heating: experiment and simulation

Sergey Babin, Peter Hudek, Ivan Kostic, Igor Kuzmin

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275800

KEYWORDS: Electron beam lithography, Critical dimension metrology, Distortion, Laser scattering, Scattering, Computing systems, Lithography, Electron beams, 3D modeling, Software development

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Proceedings Article | 12 February 1997 Paper

Paper

Software tool for temperature simulation in electron-beam lithography: TEMPTATION

Sergey Babin, Igor Kuzmin, G. Sergeev

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301219

KEYWORDS: Electron beam lithography, Software development, Lithography, Computer simulations, Monte Carlo methods, Temperature metrology, Numerical simulations, 3D modeling, Glasses, Optical simulations

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Proceedings Article | 27 December 1996 Paper

Paper

Advanced model for resist heating effect simulation in electron-beam lithography

Sergey Babin, V. Kozunov, Igor Kuzmin

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262844

KEYWORDS: Glasses, Electrons, Photomasks, Beam shaping, Software development, Lithography, Diffusion, Gaussian beams, Silicon, 3D acquisition

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Proceedings Article | 1 November 1996 Paper

Paper

Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography

Sergey Babin, Mark Weber, Hans Koops

Proceedings Volume 2863, (1996) https://doi.org/10.1117/12.256212

KEYWORDS: Microlens, Single mode fibers, Quartz, Lithography, Photoresist processing, Scanning electron microscopy, Silicon, Electron microscopes, Image processing, 3D image processing

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Proceedings Article | 14 June 1996 Paper

Paper

Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography

Hans Koops, Sergey Babin, Mark Weber, G. Dahm, A. Holopkin, M. Lyakhov

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241856

KEYWORDS: Lithography, Photoresist processing, Microlens, Silicon, Electrons, Etching, Plasma etching, Polymers, Single mode fibers, Plasma

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Proceedings Article | 7 June 1996 Paper

Paper

Method for measuring absorbed energy density in photoresist in a laser pattern generation

Sergey Babin

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240957

KEYWORDS: Photoresist materials, Photomasks, Point spread functions, Lithography, Electron beam lithography, Manufacturing, Spatial resolution, Light scattering, Laser energy, Laser development

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Proceedings Article | 7 June 1996 Paper

Paper

Rigorous electromagnetic analysis of aerial image formation in photoresist

Sergey Babin, John Sheridan

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240972

KEYWORDS: Photoresist materials, Holography, Scanning electron microscopy, Refractive index, Image acquisition, Calibration, Diffraction gratings, Photoresist developing, Reflection, Image analysis

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SPIE Journal Paper | 1 December 1995

Grazing incidence interferometry applied to the measurement of cylindrical surfaces

Thomas Dresel, Johannes Schwider, Alexander Wehrhahn, Sergey Babin

OE, Vol. 34, Issue 12, (December 1995) https://doi.org/10.1117/12.10.1117/12.215456

KEYWORDS: Axicons, Interferometry, Grazing incidence, Wavefronts, Interferometers, Computer generated holography, Phase shifts, Holograms, Diffraction, Binary data

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Proceedings Article | 6 June 1995 Paper

Paper

Photomask fabrication of focusing diffractive optical elements using electron-beam lithography

Sergey Babin, Victor Danilov

Proceedings Volume 2426, (1995) https://doi.org/10.1117/12.211192

KEYWORDS: Diffractive optical elements, Electron beam lithography, Photomasks, Lithography, Refractive index, Manufacturing, Zone plates, Etching, Electron beams, Data storage

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Proceedings Article | 12 October 1994 Paper

Paper

Variable-shaped electron beam lithography application for creation of diffractive optical elements

Sergey Babin, Victor Danilov

Proceedings Volume 2169, (1994) https://doi.org/10.1117/12.190216

KEYWORDS: Diffractive optical elements, Electron beam lithography, Photomasks, Lithography, Software development, Manufacturing, Etching, Electron beams, Computing systems, Data storage

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Proceedings Article | 13 May 1994 Paper

Paper

Techniques for determination of the absorbed energy density function in electron-beam lithography

Sergey Babin

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175814

KEYWORDS: Photoresist processing, Electron beams, Electron beam lithography, Monte Carlo methods, Lithography, Silicon, Laser scattering, Scattering, Electroplating, Gold

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Proceedings Article | 15 December 1993 Paper

Paper

Fabrication of diffractive optical elements for x-ray range

Yu Agafonov, Sergey Babin, Alexei Erko, A. Shestakov, Igor Schelokov

Proceedings Volume 1992, (1993) https://doi.org/10.1117/12.165701

KEYWORDS: Zone plates, X-rays, Mirrors, Distortion, Optical components, Silicon, X-ray optics, Etching, Diffractive optical elements, X-ray diffraction

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Proceedings Article | 4 May 1993 Paper

Paper

Waveguide argon laser

Sergey Babin, S. Khorev, Andrey Kuklin, T. Yeremenko

Proceedings Volume 1810, (1993) https://doi.org/10.1117/12.144600

KEYWORDS: Resonators, Mirrors, Waveguides, Argon ion lasers, Waveguide lasers, Radon, Gallium, Chemical lasers, Confocal microscopy, Laser resonators

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Proceedings Article | 13 January 1993 Paper

Paper

Artificial index surface relief diffraction optical elements

Sergey Babin, Helmut Haidner, Peter Kipfer, Adolf Lang, John Sheridan, Wilhelm Stork, Norbert Streibl

Proceedings Volume 1751, (1993) https://doi.org/10.1117/12.138882

KEYWORDS: Diffraction, Diffraction gratings, Micro optics, Etching, Silicon, Dielectrics, Manufacturing, Gold, Optical components, Photoresist materials

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Proceedings Article | 9 July 1992 Paper

Paper

Model and measurement of resist heating effect in EBL (Poster Paper)

Sergey Babin, Ivan Kostic, A. Svintsov

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136030

KEYWORDS: Polymethylmethacrylate, Temperature metrology, Electron beam lithography, Silicon, Lithium, Molecules, Lithography, Microelectronics, Beam shaping, Deep ultraviolet

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Proceedings Article | 9 July 1992 Paper

Paper

Electron-beam lithography of optical elements for x-ray range (Poster Paper)

Sergey Babin, Alexei Erko

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136025

KEYWORDS: Zone plates, Lithography, X-rays, Silicon, Optical components, Mirrors, X-ray optics, Electron beam lithography, Distortion, Etching

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Proceedings Article | 5 February 1992 Paper

Paper

Collisional effects in plasma-based cw Raman laser (Proceedings Only)

Sergey Babin, L. Gel'medova, D. Shapiro

Proceedings Volume 1551, (1992) https://doi.org/10.1117/12.134812

KEYWORDS: Ions, Diffusion, Laser scattering, Raman spectroscopy, Scattering, Plasma, Continuous wave operation, Raman scattering, Argon ion lasers, Doppler effect

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Proceedings Article | 1 March 1991 Paper

Paper

Behavior of amorphous semiconductors As2S3 layers after photon, electron, or x-ray exposures

Peter Guttmann, Gentsho Danev, Erintche Spassova, Sergey Babin

Proceedings Volume 1361, (1991) https://doi.org/10.1117/12.24327

KEYWORDS: Amorphous semiconductors, X-rays, Photons, Electrons, Optical properties, Electron beam lithography, Lithography, Microelectronics, Oxygen

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Proceedings Article | 1 February 1991 Paper

Paper

Comparison of high-current discharges with axial and transverse gas flow for UV ion lasers

Sergey Babin, Andrey Kuklin

Proceedings Volume 1397, (1991) https://doi.org/10.1117/12.26000

KEYWORDS: Ultraviolet radiation, Ion lasers, Chemical species, Velocity measurements, Chemical lasers, Continuous wave operation, Electrodes, Voltage controlled current source, Ions, Aluminum

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Showing 5 of 77 publications

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