High-power extreme ultraviolet source based on a Z-pinch

Malcolm W. McGeoch

doi:10.1117/12.351154

25 June 1999 High-power extreme ultraviolet source based on a Z-pinch

Malcolm W. McGeoch

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351154
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

The 1Hz helium-xenon Z-pinch previously described has been re-engineered with long-life thyratron switches to operate at 10Hz. At 10Hz, without a condenser, it currently delivers 0.2W in a 4 Angstrom band centered at 134.5A, into a solid angle of 0.03 sterad. We report on measurements of scaling of the in=-band power with stored energy, and optimization of the spectrum, either for operation at 134A with Mo-Si multilayer mirrors, or at shorter wavelengths such as 113A for use with Mo-Be mirrors. We have measured an rms pulse- to-pulse amplitude stability of 2.1 percent. No measurable loss of transmission at 134A occurred in a 250 nm silicon nitride membrane placed at 52nm axially from the plasma during a 10⁵ pulse run at full energy, indicating that the source is clean. Electrode and pinch liner erosion is not significant in test to the 10⁶ pulse level and the life of these components is projected to exceed 5 X 10⁷ pulses. the possible extension to a narrow beam of at least 4W in-band 134A, via an increase of the repetition rate to 100Hz and solid angle to 0.06 sterad, is discussed.

Citation Download Citation

Malcolm W. McGeoch "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351154

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