Micro-optical silicon elements fabricated by wet chemical etching

Joachim Fruehauf; Birgit Hannemann

doi:10.1117/12.360147

6 September 1999 Micro-optical silicon elements fabricated by wet chemical etching

Joachim Fruehauf, Birgit Hannemann

Proceedings Volume 3739, Optical Fabrication and Testing; (1999) https://doi.org/10.1117/12.360147
Event: Optical Systems Design and Production, 1999, Berlin, Germany

Abstract

Silicon is the mainly used material in the microtechnique and the crystal orientation wet chemical etching is a well known technological process in the production of microtechnical elements. The defined crystallographic faces prepared during etching and the shapes which can be created by combinations of them show properties of interest for applications in micro-optical elements. This will be demonstrated. First a systematic overview is given related to applications like fiber grooves, mirrors, beam splitters, gratings and prisms. As introduction in the crystal orientation dependent etching some basics to the process and design will be described which can be completed by many referencing. Properties like roughness, shape and inclination of the etched faces which are of relevance for optical applications are investigated. At last some special elements are described.

Citation Download Citation

Joachim Fruehauf and Birgit Hannemann "Micro-optical silicon elements fabricated by wet chemical etching", Proc. SPIE 3739, Optical Fabrication and Testing, (6 September 1999); https://doi.org/10.1117/12.360147

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