EUV engineering test stand

Daniel A. Tichenor; Glenn D. Kubiak; William C. Replogle; Leonard E. Klebanoff; John B. Wronosky; Layton C. Hale; Henry N. Chapman; John S. Taylor; James A. Folta; Claude Montcalm; Russell M. Hudyma; Kenneth A. Goldberg; Patrick P. Naulleau

doi:10.1117/12.390083

21 July 2000 EUV engineering test stand

Daniel A. Tichenor, Glenn D. Kubiak, William C. Replogle, Leonard E. Klebanoff, John B. Wronosky, Layton C. Hale, Henry N. Chapman, John S. Taylor, James A. Folta, Claude Montcalm, Russell M. Hudyma, Kenneth A. Goldberg, Patrick P. Naulleau

Author Affiliations +

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390083
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The Engineering Test Stand (ETS) is an EUV laboratory lithography tool. The purpose of the ETS is to demonstrate EUV full-field imaging and provide data required to support production-tool development. The ETS is configured to separate the imaging system and stages from the illumination system. Environmental conditions can be controlled independently in the two modules to maximize EUV throughput and environmental control. A source of 13.4 nm radiation is provided by a laser plasma source in which a YAG laser beam is focused onto a xenon-cluster target. A condenser system, comprised of multilayer-coated mirrors and grazing-incidence mirrors, collects the EUV radiation and directs it onto a reflecting reticle. A four-mirror, ring-field optical system, having a numerical aperture of 0.1, projects a 4x-reduction image onto the wafer plane. This design corresponds to a resolution of 70 nm at a k₁ of 0.52. The ETS is designed to produce full- field images in step-and-scan mode using vacuum-compatible, one-dimension-long-travel magnetically levitated stages for both reticle and wafer. Reticle protection is incorporated into the ETS design. This paper provides a system overview of the ETS design and specifications.

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Daniel A. Tichenor, Glenn D. Kubiak, William C. Replogle, Leonard E. Klebanoff, John B. Wronosky, Layton C. Hale, Henry N. Chapman, John S. Taylor, James A. Folta, Claude Montcalm, Russell M. Hudyma, Kenneth A. Goldberg, and Patrick P. Naulleau "EUV engineering test stand", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390083

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