Results from a new laser pattern generator for 180-nm photomasks

Tomas Vikholm; Lars Kjellberg; Per Askebjer; Steven Haddleton; Johan Larsson; Mans Bjuggren

doi:10.1117/12.392080

19 July 2000 Results from a new laser pattern generator for 180-nm photomasks

Tomas Vikholm, Lars Kjellberg, Per Askebjer, Steven Haddleton, Johan Larsson, Mans Bjuggren

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392080
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

180 nm photomasks require resolution and CD control that is normally not available from laser based systems. This paper describes the new Micronic Omega6000 laser pattern generator targeted at 180 nm as well as results from the system. The Omega6000 uses an architecture based on acousto-optics that improves the CD control. A 0.86 NA lens results in a high resolution. A dose modulation method provides a 5 nm address grid using single pass writing. The system incorporates a multi-processor data path designed to handle complex 180 nm patterns without reducing the writing speed. The data path is scalable which allows expansion with increasing data complexity.

Citation Download Citation

Tomas Vikholm, Lars Kjellberg, Per Askebjer, Steven Haddleton, Johan Larsson, and Mans Bjuggren "Results from a new laser pattern generator for 180-nm photomasks", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392080

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