Paper
22 August 2001 Foot (bottom corner) measurement of a structure with SPM
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Abstract
Foot (bottom corner) characterization of a trench or a line in semiconductor processing is of high interest to set and follow processes. The scanning probe microscopes (SPM) available at the present time are not capable of obtaining this measurement. Conventional atomic force microscopes (AFM) are not able to measure the shape of the foot of a trench or a line due to scanning algorithm and probe shape. Even CD-AFM performed with 2 dimensional servo code and boot shaped tips is limited in its ability to make this measurement if the corner is sharper than the radius of the corner of the boot tip used for measurement. We use an extra sharp probe (full cone angle 5 degrees or less) and a technique to tilt the sample to get at the foot of the structure to be measured. We are able to scan this corner of the structure and are able to characterize it by various techniques such as surface roughness. In addition, sidewall, line and line edge roughness can be addressed using the same technique. This characterization can be performed automatically and set as a production control.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Meyyappan, Martin A. Klos, and Sylvain Muckenhirn "Foot (bottom corner) measurement of a structure with SPM", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436801
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Cited by 7 scholarly publications.
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KEYWORDS
Scanning probe microscopy

Edge roughness

Scanning electron microscopy

Surface roughness

Atomic force microscope

Atomic force microscopy

Line edge roughness

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