Dr. A Meyyappan Profile

Dr. A Meyyappan

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Publications (7)

Proceedings Article | 22 August 2001 Paper

Measurement of sidewall, line, and line-edge roughness with scanning probe microscopy

Kelvin Walch, A. Meyyappan, Sylvain Muckenhirn, Jacques Margail

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436800

KEYWORDS: Control systems, Manufacturing, Semiconductors, Semiconductor manufacturing, Etching, Metrology, Scanning probe microscopy, Edge roughness, Scanning probe microscopes, Critical dimension metrology

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Proceedings Article | 22 August 2001 Paper

Foot (bottom corner) measurement of a structure with SPM

A. Meyyappan, Martin Klos, Sylvain Muckenhirn

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436801

KEYWORDS: Scanning probe microscopy, Surface roughness, Scanning electron microscopy, Edge roughness, Semiconductor manufacturing, Scanning probe microscopes, Atomic force microscope, Atomic force microscopy, Line edge roughness, Servomechanisms

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Proceedings Article | 22 August 2001 Paper

SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features

Sylvain Muckenhirn, A. Meyyappan, Kelvin Walch, Mark Maslow, Geert Vandenberghe, Johannes van Wingerden

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436742

KEYWORDS: Photomasks, Scanning probe microscopy, Quartz, Phase shifts, Chromium, Semiconducting wafers, Etching, Silicon, Capillaries, Computer aided design

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Proceedings Article | 14 June 1999 Paper

Atomic force microscopy: a diagnostic tool (in) for mask making in the coming years

Syed Rizvi, A. Meyyappan

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350861

KEYWORDS: Mask making, Diagnostics, Atomic force microscopy, Surface roughness, Atomic force microscope, Image quality, Manufacturing, Phase shifts, Silicon, Semiconducting wafers

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Proceedings Article | 14 June 1999 Paper

High-aspect-ratio depth determination using nondestructive AFM

V.C. Jai Prakash, Mark Lagus, A. Meyyappan, Sylvain Muckenhirn

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350814

KEYWORDS: Critical dimension metrology, Nondestructive evaluation, Atomic force microscopy, Process control, Manufacturing, Algorithm development, Semiconducting wafers, Pattern recognition, Microelectronics, Metrology

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Proceedings Article | 8 June 1998 Paper

Photoresist focus exposure matrix (FEM) measurements using critical-dimension atomic force microscopy (CD AFM)

A. Meyyappan, Sylvain Muckenhirn

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308777

KEYWORDS: Matrices, Metrology, Lithography, Photoresist materials, Calibration, Atomic force microscopy, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Finite element methods

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Proceedings Article | 8 June 1998 Paper

Critical-dimension atomic force microscope (CD-AFM) measurement of masks

Sylvain Muckenhirn, A. Meyyappan

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308778

KEYWORDS: Photomasks, Inspection, Calibration, Atomic force microscope, Chromium, Metrology, Semiconducting wafers, Optical proximity correction, Etching, Atomic force microscopy

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Showing 5 of 7 publications

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