Mr. Sylvain G. Muckenhirn Profile

Sylvain G. Muckenhirn

President

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Publications (8)

Proceedings Article | 24 March 2016 Paper

Topological study of nanomaterials using surface-enhanced ellipsometric contrast microscopy (SEEC)

Sylvain Muckenhirn

Proceedings Volume 9778, 97780R (2016) https://doi.org/10.1117/12.2220592

KEYWORDS: Sensors, Microscopy, Graphene, Polarization, Visualization, Process control, Nanomaterials, Coating, Optical imaging, Image resolution, Precision measurement, Carbon nanotubes, DNA nanotechnology, Nano coatings, Nanobiotechnology, Silicon, Image sensors, Image visualization, Atomic force microscopy

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Proceedings Article | 10 July 2003 Paper

Applications of image diagnostics to metrology quality assurance and process control

John Allgair, Victor Boksha, Benjamin Bunday, Alain Diebold, Daniel Cole, Mark Davidson, Jerry Hutcheson, Andrew Gurnell, David Joy, John McIntosh, Sylvain Muckenhirn, Joseph Pellegrini, Robert Larrabee, James Potzick, Andras Vladar, Nigel Smith, Alexander Starikov, Neal Sullivan, Oliver Wells

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.504320

KEYWORDS: Metrology, Diagnostics, Dimensional metrology, Optical lithography, Manufacturing, Process control, Image processing, Critical dimension metrology, Semiconducting wafers, Edge roughness

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Proceedings Article | 22 August 2001 Paper

SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features

Sylvain Muckenhirn, A. Meyyappan, Kelvin Walch, Mark Maslow, Geert Vandenberghe, Johannes van Wingerden

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436742

KEYWORDS: Photomasks, Scanning probe microscopy, Quartz, Phase shifts, Chromium, Semiconducting wafers, Etching, Silicon, Capillaries, Computer aided design

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Proceedings Article | 22 August 2001 Paper

Measurement of sidewall, line, and line-edge roughness with scanning probe microscopy

Kelvin Walch, A. Meyyappan, Sylvain Muckenhirn, Jacques Margail

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436800

KEYWORDS: Critical dimension metrology, Scanning probe microscopes, Edge roughness, Scanning probe microscopy, Metrology, Etching, Semiconductor manufacturing, Semiconductors, Manufacturing, Control systems

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Proceedings Article | 22 August 2001 Paper

Foot (bottom corner) measurement of a structure with SPM

A. Meyyappan, Martin Klos, Sylvain Muckenhirn

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436801

KEYWORDS: Scanning probe microscopy, Surface roughness, Scanning electron microscopy, Edge roughness, Semiconductor manufacturing, Scanning probe microscopes, Atomic force microscope, Atomic force microscopy, Line edge roughness, Servomechanisms

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Proceedings Article | 14 June 1999 Paper

High-aspect-ratio depth determination using nondestructive AFM

V.C. Jai Prakash, Mark Lagus, A. Meyyappan, Sylvain Muckenhirn

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350814

KEYWORDS: Critical dimension metrology, Nondestructive evaluation, Atomic force microscopy, Process control, Manufacturing, Algorithm development, Semiconducting wafers, Pattern recognition, Microelectronics, Metrology

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Proceedings Article | 8 June 1998 Paper

Photoresist focus exposure matrix (FEM) measurements using critical-dimension atomic force microscopy (CD AFM)

A. Meyyappan, Sylvain Muckenhirn

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308777

KEYWORDS: Finite element methods, Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Atomic force microscopy, Calibration, Photoresist materials, Lithography, Metrology, Matrices

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Proceedings Article | 8 June 1998 Paper

Critical-dimension atomic force microscope (CD-AFM) measurement of masks

Sylvain Muckenhirn, A. Meyyappan

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308778

KEYWORDS: Photomasks, Inspection, Calibration, Atomic force microscope, Chromium, Metrology, Semiconducting wafers, Optical proximity correction, Etching, Atomic force microscopy

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Showing 5 of 8 publications

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