Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography

Bruno S. Bauer; Andrey Esaulov; Volodymyr Makhin; Roberto C. Mancini; Ioana Paraschiv; Radu Presura; Irvin R. Lindemuth; Peter T. Sheehey; Bryan J. Rice

doi:10.1117/12.484933

16 June 2003 Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography

Bruno S. Bauer, Andrey Esaulov, Volodymyr Makhin, Roberto C. Mancini, Ioana Paraschiv, Radu Presura, Irvin R. Lindemuth, Peter T. Sheehey, Bryan J. Rice

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484933
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

A radiation-magnetohydrodynamic (MHD) model of gas discharges has been developed to accelerate the development of compact, intense sources of EUV radiation for microlithography. The model is an MHD numerical simulation with atomic and radiation physics. The plasma evolution is simulated with the MHRDR (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code. The MHD results are postprocessed with a code that calculates the 13.4-nm EUV radiation output from Xe ions, based on a detailed collisional-radiative atomic kinetics model. Modeling of a dense plasma focus discharge, in a Xe-He gas mixture, has been initiated with this new tool.

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Bruno S. Bauer, Andrey Esaulov, Volodymyr Makhin, Roberto C. Mancini, Ioana Paraschiv, Radu Presura, Irvin R. Lindemuth, Peter T. Sheehey, and Bryan J. Rice "Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484933

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