Thin film and high-etch-rate type 248-nm bottom antireflective coatings

Tomoyuki Enomoto; Satoshi Takei; Takahiro Kishioka; Tadashi Hatanaka; Rikimaru Sakamoto; Yasuyuki Nakajima

doi:10.1117/12.534653

14 May 2004 Thin film and high-etch-rate type 248-nm bottom antireflective coatings

Tomoyuki Enomoto, Satoshi Takei, Takahiro Kishioka, Tadashi Hatanaka, Rikimaru Sakamoto, Yasuyuki Nakajima

Proceedings Volume 5376, Advances in Resist Technology and Processing XXI; (2004) https://doi.org/10.1117/12.534653
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A frequent problem encountered by photoresists during the manufacturing of semiconductor device is that activating radiation is reflected back into the photoresist by the substrate. So, it is necessary that the light reflection is reduced from the substrate. One approach to reduce the light reflection is the use of bottom anti-reflective coating (BARC) applied to the substrate beneath the photoresist layer. The BARC technology has been utilized for a few years to minimize the reflectivity. As the chip size is reduced to sub 0.13 micron, the photoresist thickness has to decrease with the aspect ratio being less than 3.0. Therefore, new Organic BARC is strongly required which has the minimum reflectivity with thinner BARC thickness and higher etch selectivity toward resists. Nissan Chemical Industries, Ltd. and Brewer Science, Inc. have developed the advanced Organic BARC for achieving the above purpose. As a result, the suitable high performance NCA3000 series 248nm Organic BARCs were developed. Using CF4 gas as etchant, the plasma etch rate of NCA3000 series is about 1.4-1.6 times higher than that of conventional 248nm resists and 1.1-1.2 times higher than that of the existing product. The NCA3000 series can minimize the substrate reflectivity at below 45nm BARC thickness, shows excellent litho performance and coating properties.

Citation Download Citation

Tomoyuki Enomoto, Satoshi Takei, Takahiro Kishioka, Tadashi Hatanaka, Rikimaru Sakamoto, and Yasuyuki Nakajima "Thin film and high-etch-rate type 248-nm bottom antireflective coatings", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.534653

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