Prof. Satoshi Takei Profile

Prof. Satoshi Takei

Chemist at Toyama Prefectural Univ

Profile Summary

Satoshi Takei is a professor in Toyama Prefectural University, and a visiting academic staff in Osaka University. He was a member in Nissan Chemical Industries from 1998 to 2010. In 2001, he was a visiting assignee in IMEC. In 2009, he was a visiting scientist of Prof. C. Grant Willson laboratory in University of Texas at Austin and NNIN.

Publications (58)

Proceedings Article | 26 March 2019 Paper

Paper

Gas permeable mold for defect reduction in nanoimprint lithography

Kento Mizui, Makoto Hanabata, Satoshi Takei

Proceedings Volume 10958, 1095818 (2019) https://doi.org/10.1117/12.2514790

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Quartz, Liquids, Applied physics, Coating, Industrial chemicals, Glasses, Silicon, Semiconducting wafers

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Proceedings Article | 9 October 2018 Paper

Paper

High volume manufacturing of optical MEMS devices using biomass nano-patterning materials and ecofriendly developable lithography processes

Satoshi Takei

Proceedings Volume 10787, 107870W (2018) https://doi.org/10.1117/12.2324962

KEYWORDS: Lithography, Bioalcohols, Etching, Microopto electromechanical systems, High volume manufacturing, Polymers, Nanofabrication, Nanostructures, Electron beam lithography, Coating

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Proceedings Article | 9 October 2018 Paper

Paper

Internal structure of metal material with gas permeability function related to MEMS devices

Naoto Sugino, Takao Kameda, Satoshi Takei, Makoto Hanabata

Proceedings Volume 10787, 107870X (2018) https://doi.org/10.1117/12.2325315

KEYWORDS: Metals, Microelectromechanical systems, 3D printing, X-rays, Computed tomography, Nanoimprint lithography, Printing, Laser cutting, X-ray imaging, Digital cameras

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Proceedings Article | 9 October 2018 Paper

Paper

Utilization of gas permeable metal plate for the purpose of reduction of transfer defect in MEMS electronic device

Takao Kameda, Naoto Sugino, Satoshi Takei, Makoto Hanabata

Proceedings Volume 10787, 107870Y (2018) https://doi.org/10.1117/12.2325321

KEYWORDS: Metals, Microelectromechanical systems, Confocal microscopy, Microscopes, Glasses, Electronic components, Ultraviolet radiation, Nanoimprint lithography, 3D printing, Lithography

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Proceedings Article | 19 March 2018 Paper

Paper

Gas permeable template derived from cellulose in ultraviolet nanoimprint

Shinya Nakajima, Kento Mizui, Makoto Hanabata, Satoshi Takei

Proceedings Volume 10584, 1058416 (2018) https://doi.org/10.1117/12.2297093

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Transmittance, Manufacturing

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Proceedings Article | 19 March 2018 Paper

Paper

Nanoimprint lithography using gas permeable template II

Makoto Hanabata, Satoshi Takei, Shinya Nakajima, Naoto Sugino, Yoko Matsumoto, Atsushi Sekiguchi

Proceedings Volume 10584, 1058415 (2018) https://doi.org/10.1117/12.2295147

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Silicon, Optical lithography, Oxygen, Quartz, Nanofibers, Scanning electron microscopy, Lithography, Industrial chemicals

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Proceedings Article | 19 March 2018 Paper

Paper

Green ethanol-developable electron beam lithography processes using positive tone biomass resist material

Satoshi Takei

Proceedings Volume 10584, 1058414 (2018) https://doi.org/10.1117/12.2295145

KEYWORDS: Etching, Photoresist processing, Electron beam lithography, Image processing, Lithography, Polymers, Carbon, Chemical reactions, Oxygen, Chemical species

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Proceedings Article | 31 August 2017 Paper

Paper

Extreme-ultraviolet and electron beam lithography processing using water developable resist material

Satoshi Takei

Proceedings Volume 10354, 1035414 (2017) https://doi.org/10.1117/12.2271024

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photoresist processing, Electron beams, Manufacturing, Semiconductors, Electron beam lithography, Microelectromechanical systems, Nanoelectromechanical systems

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Proceedings Article | 31 August 2017 Paper

Paper

Temperature dependency of mechanical properties for crystalline cellulose added to silicone elastomer

Takao Kameda, Naoto Sugino, Satoshi Takei, Makoto Hanabata

Proceedings Volume 10354, 103541E (2017) https://doi.org/10.1117/12.2273464

KEYWORDS: Silicon, Crystals, Composites, Electronic components, Nanofibers, Solar cells, Antennas, Temperature metrology, Crystallography

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Proceedings Article | 31 August 2017 Paper

Paper

Temperature dependence of viscoelasticity of crystalline cellulose with different molecular weights added to silicone elastomer

Naoto Sugino, Shinya Nakajima, Takao Kameda, Satoshi Takei, Makoto Hanabata

Proceedings Volume 10354, 103541F (2017) https://doi.org/10.1117/12.2273503

KEYWORDS: Crystals, Silicon, Composites, Metals, Crystallography

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Proceedings Article | 31 August 2017 Paper

Paper

High resolution patterning of ultraviolet cross-linked resins using gas permeable mold derived from cellulose in nanoimprint lithography

Shinya Nakajima, Satoshi Takei, Makoto Hanabata, Naoto Sugino, Takao Kameda, Yoko Matsumoto, Atsushi Sekiguchi

Proceedings Volume 10354, 103541B (2017) https://doi.org/10.1117/12.2273270

KEYWORDS: Nanoimprint lithography

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Proceedings Article | 31 August 2017 Paper

Paper

Organic-inorganic hybrid resist materials in advanced lithography

Satoshi Takei, Naoto Sugino, Makoto Hanabata

Proceedings Volume 10354, 103541Q (2017) https://doi.org/10.1117/12.2275105

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Nanostructures, Lithography, Natural surfaces, Photoresist processing, Contamination, Nanoelectronics

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Proceedings Article | 27 March 2017 Paper

Paper

Nanoimprint lithography using gas permeable template

Makoto Hanabata, Satoshi Takei, Shinya Nakajima, Naoto Sugino, Yoko Matsumoto, Atsushi Sekiguchi

Proceedings Volume 10146, 101461I (2017) https://doi.org/10.1117/12.2257095

KEYWORDS: Nanoimprint lithography, Quartz, Nanostructures, Ultraviolet radiation, Polymers, Optical lithography, Nanofibers, Adsorption, Silicon, Oxygen, Lithography, Liquids, Scanning electron microscopy, Line edge roughness

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Proceedings Article | 27 March 2017 Paper

Paper

Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2)

Atsushi Sekiguchi, Yoko Matsumoto, Yoshihisa Sensu, Satoshi Takei, Makoto Hanabata, Hatsuyuki Tanaka

Proceedings Volume 10146, 101461K (2017) https://doi.org/10.1117/12.2257548

KEYWORDS: Lithography, Flat panel displays, Microelectromechanical systems, Picture Archiving and Communication System, Electroluminescence, Optical lithography, Polymers, Manufacturing, Photoresist processing, Solids

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Proceedings Article | 5 October 2016 Paper

Paper

Production and evaluation of measuring equipment for share viscosity of polymer melts included nanofiller with injection molding machine

Takao Kameda, Naoto Sugino, Satoshi Takei

Proceedings Volume 9985, 99852D (2016) https://doi.org/10.1117/12.2243417

KEYWORDS: Polymers, Lithography, Measurement devices, Metals, Sensors, Protactinium, Transducers, Eye, Temperature metrology, Molecules

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Proceedings Article | 5 October 2016 Paper

Paper

Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue

Satoshi Takei, Naoto Sugino, Takao Kameda, Shinya Nakajima, Makoto Hanabata

Proceedings Volume 9985, 99852C (2016) https://doi.org/10.1117/12.2243401

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Photomasks, Adsorption, Optical lithography, Materials processing, Ultraviolet radiation, Optical lithography, Glucose, Oxygen, Resistance, Scanning probe microscopy

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Proceedings Article | 5 October 2016 Paper

Paper

Fundamental study of green EUV lithography using natural polysaccharide for the use of pure water in developable process

Satoshi Takei

Proceedings Volume 9985, 99852B (2016) https://doi.org/10.1117/12.2243399

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Polymers, Photoresist processing, Lithography, Etching, Manufacturing, Silicon, Chemical species

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Proceedings Article | 4 October 2016 Paper

Paper

Evaluation of the properties of the permeability film material using cellulose nanofibers

Naoto Sugino, Shinya Nakajima, Takao Kameda, Satoshi Takei, Makoto Hanabata

Proceedings Volume 9985, 99851I (2016) https://doi.org/10.1117/12.2243418

KEYWORDS: Nanofibers, Nanoimprint lithography, Transmittance, Lithography, Ultraviolet radiation, Nanotechnology, Transparency, Silicon, Optical lithography, Polymers

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Proceedings Article | 1 April 2016 Paper

Paper

Nanoimprint lithography using disposable biomass template

Makoto Hanabata, Satoshi Takei, Kigen Sugahara, Shinya Nakajima, Naoto Sugino, Takao Kameda, Jiro Fukushima, Yoko Matsumoto, Atsushi Sekiguchi

Proceedings Volume 9777, 97771G (2016) https://doi.org/10.1117/12.2217483

KEYWORDS: Nanoimprint lithography, Nanostructures, Ultraviolet radiation, Quartz, Polymers, Nanofibers, Nanotechnology, Lithography, Silicon, Scanning electron microscopy, Polymerization, Resistance, Oxygen, Materials processing

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Proceedings Article | 25 March 2016 Paper

Paper

Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin

Atsushi Sekiguchi, Yoko Matsumoto, Hatsuyuki Tanaka, Toshiyuki Horiuchi, Yoshihisa Sensu, Satoshi Takei, Makoto Hanabata

Proceedings Volume 9779, 97791L (2016) https://doi.org/10.1117/12.2218948

KEYWORDS: Picture Archiving and Communication System, Lithography, Astatine, Optical lithography, Flat panel displays, Microelectromechanical systems, Electroluminescence, Solids, Manufacturing, Photoresist processing

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Proceedings Article | 21 March 2016 Paper

Paper

EB and EUV lithography using inedible cellulose-based biomass resist material

Satoshi Takei, Makoto Hanabata, Akihiro Oshima, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 9779, 977929 (2016) https://doi.org/10.1117/12.2217481

KEYWORDS: Lithography, Extreme ultraviolet lithography, Photoresist processing, Electron beam lithography, Electron beams, Extreme ultraviolet, Etching, Silicon, Polymers, Chemical species, Oxygen

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Proceedings Article | 7 May 2015 Paper

Paper

Nanoimprint lithography using TiO2-SiO2 ultraviolet curable materials

Satoshi Takei

Proceedings Volume 9507, 95070U (2015) https://doi.org/10.1117/12.2178347

KEYWORDS: Ultraviolet radiation, Etching, Silica, Nanoimprint lithography, Titanium, Carbon, Sol-gels, Quartz, Nanostructures, Titanium dioxide

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Proceedings Article | 20 March 2015 Paper

Paper

Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency

Satoshi Takei, Makoto Hanabata

Proceedings Volume 9425, 94251V (2015) https://doi.org/10.1117/12.2081820

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Transparency, Antireflective coatings, Nanostructures, Fluorine, Lithography, Optical lithography, Liquids, Metals

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Proceedings Article | 20 March 2015 Paper

Paper

Light-scattering thermal cross-linking material using morphology of nanoparticle free polymer blends

Satoshi Takei

Proceedings Volume 9425, 94251M (2015) https://doi.org/10.1117/12.2081825

KEYWORDS: Polymers, Light scattering, LCDs, Light emitting diodes, Nanoparticles, Polymer thin films, Epoxies, Organic light emitting diodes, LED backlight, Oxygen

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Proceedings Article | 20 March 2015 Paper

Paper

High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography

Satoshi Takei, Makoto Hanabata, Akihiro Oshima, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 9425, 94251P (2015) https://doi.org/10.1117/12.2081829

KEYWORDS: Photoresist processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Etching, Polymers, Silicon, Oxygen, Chemical species, Thin films

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SPIE Journal Paper | 16 July 2014 Open Access

Open Access

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Satoshi Takei, Makoto Hanabata, C. Grant Willson

JM3, Vol. 13, Issue 03, 031302, (July 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031302

KEYWORDS: Etching, Ultraviolet radiation, Lithography, Silicon, Scanning electron microscopy, Industrial chemicals, Coating, Liquids, Plasma etching, Epoxies

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Proceedings Article | 14 May 2014 Paper

Paper

Ultraviolet curing nanoimprint green lithography using water-repellent film derived from biomass for solar cells devices

Satoshi Takei, Kenta Ito, Gaku Murakami, Tsutomu Obata, Yoshiyuki Yokoyama, Kigenn Sugahara, Takumi Ichikawa, Wataru Mizuno, Junji Sumioka, Masayuki Fujii, Tetsuro Okada

Proceedings Volume 9140, 91400V (2014) https://doi.org/10.1117/12.2045640

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Lithography, Glucose, Silicon, Liquids, Refractive index, Optical lithography, Polymers, Microscopes

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Proceedings Article | 8 May 2014 Paper

Paper

Organic solvent-free sugar-based transparency nanopatterning material derived from biomass for eco-friendly optical biochips using green lithography

Satoshi Takei, Akihiro Oshima, Tomoko Oyama, Kenta Ito, Kigenn Sugahara, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 9129, 912917 (2014) https://doi.org/10.1117/12.2045633

KEYWORDS: Nanostructures, Lithography, Transparency, Antireflective coatings, Refractive index, Biomedical optics, Polymers, Electron beam lithography, Interfaces, Biology

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Proceedings Article | 2 May 2014 Paper

Paper

Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS

Satoshi Takei, Akihiro Oshima, Kenta Ito, Kigenn Sugahara, Miki Kashiwakura, Tomoko Oyama, Takahiro Kozawa, Seiichi Tagawa, Makoto Hanabata

Proceedings Volume 9130, 913011 (2014) https://doi.org/10.1117/12.2045636

KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Polymers, Nanoelectromechanical systems, Etching, Microelectromechanical systems, Glucose, Dry etching

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SPIE Journal Paper | 29 August 2013 Open Access

Open Access

Ecofriendly antiglare film derived from biomass using ultraviolet curing nanoimprint lithography for high-definition display

Satoshi Takei, Gaku Murakami, Yuto Mori, Takumi Ichikawa, Atsushi Sekiguchi, Tsutomu Obata, Yoshiyuki Yokoyama, Wataru Mizuno, Junji Sumioka, Yuji Horita

JM3, Vol. 12, Issue 03, 031113, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031113

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Refractive index, Glucose, Polymers, Nanostructures, LCDs, Polymerization, Scanning probe microscopy, Liquids

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Proceedings Article | 29 March 2013 Paper

Paper

EUV lithography using water-developable resist material derived from biomass

Satoshi Takei, Akihiro Oshima, Tomoko Oyama, Takumi Ichikawa, Atsushi Sekiguchi, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 8682, 86821T (2013) https://doi.org/10.1117/12.2010643

KEYWORDS: Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist processing, Absorption, Image processing, Polymers, Etching, Safety, Optical lithography

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Proceedings Article | 29 March 2013 Paper

Paper

Fabrication of optical film derived from biomass using eco-friendly nanoimprint lithography

Satoshi Takei, Gaku Murakami, Yuto Mori, Takumi Ichikawa, Atsushi Sekiguchi, Tsutomu Obata, Yoshiyuki Yokoyama, Wataru Mizuno, Junji Sumioka, Yuji Horita

Proceedings Volume 8682, 868224 (2013) https://doi.org/10.1117/12.2010645

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Silicon, Refractive index, Glucose, Polymers, Scanning probe microscopy, Nanostructures, Optical lithography, Lithography

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Proceedings Article | 29 March 2013 Paper

Paper

Light scattering by organic crosslinking material using nanomorphology of polymer blends

Satoshi Takei, Naoya Kubo, Takumi Ichikawa, Kazuki Maekawa, Yoshiyuki Yokoyama

Proceedings Volume 8682, 86821M (2013) https://doi.org/10.1117/12.2010646

KEYWORDS: Polymers, Light scattering, LCDs, Light emitting diodes, Polymer thin films, Epoxies, Oxygen, LED backlight, Organic light emitting diodes, Particles

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Proceedings Article | 9 May 2012 Paper

Paper

Development of plant-based resist material derived from biomass on hardmask layer in ultraviolet curing nanoimprint lithography

Satoshi Takei

Proceedings Volume 8428, 84281U (2012) https://doi.org/10.1117/12.924636

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Nanotechnology, Photoresist processing, Lithography, Light emitting diodes, Excimer lasers, Optical lithography, Nanostructures, Solar cells

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Proceedings Article | 9 May 2012 Paper

Paper

Development of light-scattering thermal cross-linking package film based on self-assembly for liquid crystal display using light emitting diode

Satoshi Takei, Kazuhide Mochizuki, Naoya Kubo, Yoshiyuki Yokoyama

Proceedings Volume 8428, 84281T (2012) https://doi.org/10.1117/12.924633

KEYWORDS: Polymers, LCDs, Polymer thin films, Molecular self-assembly, Light emitting diodes, Epoxies, Light scattering, LED backlight, LED displays, Transmittance

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Proceedings Article | 9 May 2012 Paper

Paper

Development of water-developable resist material derived from biomass in EB lithography

Satoshi Takei, Akihiro Oshima, Takanori Wakabayashi, Atsushi Sekiguchi, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 8428, 84281V (2012) https://doi.org/10.1117/12.924802

KEYWORDS: Lithography, Photoresist processing, Polymers, Dry etching, Silicon, Etching, Electronic components, Coating, Semiconducting wafers, Safety

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Proceedings Article | 16 April 2011 Paper

Paper

Development of hard mask resist materials in nanoimprint lithography

Satoshi Takei, Tsuyoshi Ogawa

Proceedings Volume 7972, 79722C (2011) https://doi.org/10.1117/12.881495

KEYWORDS: Photomasks, Ultraviolet radiation, Nanoimprint lithography, Fluorine, Silicon, Photoresist processing, Lithography, Optical lithography, Contamination, Epoxies

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Proceedings Article | 16 April 2011 Paper

Paper

Development of plant-based resist materials in electron beam lithography

Satoshi Takei, Akihiro Oshima, Naomi Yanamori, Atsushi Sekiguchi, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 7972, 797229 (2011) https://doi.org/10.1117/12.878451

KEYWORDS: Lithography, Etching, Electron beam lithography, Photoresist processing, Glucose, Polymerization, Carbon, Oxygen, Photomasks, Electron beams

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SPIE Journal Paper | 1 July 2010

Plant-based resist materials for ultraviolet curing nanoimprint lithography

Satoshi Takei

JM3, Vol. 9, Issue 03, 033006, (July 2010) https://doi.org/10.1117/12.10.1117/1.3475951

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Proceedings Article | 3 April 2010 Paper

Paper

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, Satoshi Takei, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Makoto Hanabata, C. Grant Willson

Proceedings Volume 7637, 763708 (2010) https://doi.org/10.1117/12.846430

KEYWORDS: Silicon, Ultraviolet radiation, Etching, Oxygen, Silicon carbide, Lithography, Scanning electron microscopy, Coating, Liquids, Epoxies

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Proceedings Article | 31 March 2010 Paper

Paper

Development of spin-on hard mask materials under resist in nano imprint lithography

Satoshi Takei, Tsuyoshi Ogawa, Ryan Deschner, Kane Jen, Makoto Hanabata, C. Willson

Proceedings Volume 7639, 76391C (2010) https://doi.org/10.1117/12.853200

KEYWORDS: Lithography, Photomasks, Ultraviolet radiation, Etching, Photoresist processing, Nanoimprint lithography, Electron beam lithography, Oxygen, Resistance, Silicon

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Proceedings Article | 1 April 2009 Paper

Paper

Feasibility studies of coating method for planarization process

Kentaro Matsunaga, Tomoya Oori, Hirokazu Kato, Eishi Shiobara, Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Yusuke Horiguchi, Tomoya Ohashi, Satoshi Takei, Shinichi Ito

Proceedings Volume 7273, 72734E (2009) https://doi.org/10.1117/12.813647

KEYWORDS: Ultraviolet radiation, Coating, Lithography, Materials processing, Atomic force microscopy, Critical dimension metrology, Semiconducting wafers, Photoresist processing, Polymers, Scanning transmission electron microscopy

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Proceedings Article | 1 April 2009 Paper

Paper

Development of novel UV cross-linkable materials for enhancing planarity in via applications via the correlation of simulated and experimental analyses

Satoshi Takei, Michael Lin, Sangwoong Yoon, Tomoya Ohashi, Yasuyuki Nakajima, C. Grant Willson

Proceedings Volume 7273, 72730W (2009) https://doi.org/10.1117/12.813530

KEYWORDS: Ultraviolet radiation, Coating, Lithography, Etching, Semiconducting wafers, Liquids, Chemical analysis, Antireflective coatings, Dielectrics, Industrial chemicals

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SPIE Journal Paper | 1 October 2008

Advanced ultraviolet cross-link process and materials for global planarization

Satoshi Takei, Yusuke Horiguchi, Tomoya Ohashi, Yuichi Mano, Makoto Muramatsu, Mitsuaki Iwashita, Katsuhiro Tsuchiya, Akira Samura

JM3, Vol. 7, Issue 04, 043005, (October 2008) https://doi.org/10.1117/12.10.1117/1.2990739

KEYWORDS: Extreme ultraviolet, Ultraviolet radiation, Semiconducting wafers, Etching, Lithography, Chemical mechanical planarization, Materials processing, Coating, Silicon, Dielectrics

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Proceedings Article | 4 September 2008 Paper

Paper

Ultraviolet cross-link process using spin-coating materials for advanced planarization and sublimate defect reduction

Satoshi Takei, Makoto Muramatsu, Yusuke Horiguchi, Tomoya Ohashi, Yasuyuki Nakajima, Yuichi Mano, Mitsuaki Iwashita, Katsuhiro Tsuchiya, Tadayuki Yamaguchi

Proceedings Volume 7030, 703010 (2008) https://doi.org/10.1117/12.797401

KEYWORDS: Ultraviolet radiation, Semiconducting wafers, Materials processing, Lithography, Coating, Silicon, Etching, Wet etching, Photoresist materials, Standards development

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Proceedings Article | 15 April 2008 Paper

Paper

High-etch-rate bottom-antireflective coating and gap-fill materials using dextrin derivatives in via first dual-damascene lithography process

Satoshi Takei, Yasushi Sakaida, Tetsuya Shinjo, Keisuke Hashimoto, Yasuyuki Nakajima

Proceedings Volume 6923, 69232P (2008) https://doi.org/10.1117/12.771902

KEYWORDS: Etching, Lithography, Polymers, Reflectivity, Coating, Semiconducting wafers, Silicon, Reactive ion etching, Dielectrics, Bottom antireflective coatings

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Proceedings Article | 26 March 2008 Paper

Paper

Advanced ultraviolet cross-link process and materials for global planarization

Satoshi Takei, Yusuke Horiguchi, Tomoya Ohashi, Bang-Ching Ho, Yasuyuki Nakajima, Yuichi Mano, Makoto Muramatsu, Mitsuaki Iwashita, Katsuhiro Tsuchiya, Akira Samura, Yoshiaki Yamada, Tadayuki Yamaguchi

Proceedings Volume 6923, 69232K (2008) https://doi.org/10.1117/12.771934

KEYWORDS: Ultraviolet radiation, Etching, Semiconducting wafers, Chemical mechanical planarization, Coating, Lithography, Dielectrics, Silicon, Double patterning technology, Materials processing

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Proceedings Article | 2 April 2007 Paper

Paper

Multilayer BARCs for hyper-NA immersion lithography process

Yasushi Sakaida, Makoto Nakajima, Shigeo Kimura, Takahiro Sakaguchi, Keisuke Hashimoto, Hikaru Imamura

Proceedings Volume 6519, 65192A (2007) https://doi.org/10.1117/12.711382

KEYWORDS: System on a chip, Etching, Silicon, Reflectivity, Lithography, Immersion lithography, Photoresist processing, Reflection, Sensors, Semiconducting wafers

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Proceedings Article | 30 March 2007 Paper

Paper

Effect of solvents and cross-link reaction group concentration on via filling performance in gap fill materials

Satoshi Takei, Yasushi Sakaida, Tetsuya Shinjo

Proceedings Volume 6519, 65192V (2007) https://doi.org/10.1117/12.711308

KEYWORDS: Lithography, Polymers, Semiconducting wafers, Coating, Silicon, Etching, Bottom antireflective coatings, Photoresist processing, Copper, Semiconductors

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Proceedings Article | 26 March 2007 Paper

Paper

Novel approach of UV cross- link process for advanced planarization technology in 32-45 nm lithography

Satoshi Takei, Yusuke Horiguchi, Tetsuya Shinjo, Bang-Ching Ho, Yuichi Mano, Yasuyuki Nakajima, Makoto Muramatsu, Mitsuaki Iwashita, Katsuhiro Tsuchiya

Proceedings Volume 6519, 651933 (2007) https://doi.org/10.1117/12.711362

KEYWORDS: Extreme ultraviolet, Ultraviolet radiation, Lithography, Etching, Semiconducting wafers, Silicon, Optical lithography, Photoresist processing, Dry etching, Photoresist materials

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Proceedings Article | 23 March 2007 Paper

Paper

Wet-recess gap-fill materials for an advanced dual damascene process

Tetsuya Shinjo, Satoshi Takei, Yusuke Horiguchi, Yasuyuki Nakajima

Proceedings Volume 6519, 651930 (2007) https://doi.org/10.1117/12.712461

KEYWORDS: Semiconducting wafers, Etching, Photoresist materials, Standards development, Lithography, Photoresist developing, Reactive ion etching, Thin film coatings, Coating, Antireflective coatings

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Proceedings Article | 11 April 2006 Paper

Paper

Design and development of next-generation bottom anti-reflective coatings for 45nm process with hyper NA lithography

Makoto Nakajima, Takahiro Sakaguchi, Keisuke Hashimoto, Rikimaru Sakamoto, Takahiro Kishioka, Satoshi Takei, Tomoyuki Enomoto, Yasuyuki Nakajima

Proceedings Volume 6153, 61532L (2006) https://doi.org/10.1117/12.656132

KEYWORDS: System on a chip, Etching, Photoresist processing, Lithography, Photomasks, Silicon, Semiconducting wafers, Reflectivity, Bottom antireflective coatings, Carbon

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Proceedings Article | 11 April 2006 Paper

Paper

New advanced BARC and gap fill materials based on sublimate reduction for 193nm lithography

Satoshi Takei, Tetsuya Shinjo, Yasushi Sakaida, Yusuke Horiguchi, Yasuyuki Nakajima

Proceedings Volume 6153, 61532Q (2006) https://doi.org/10.1117/12.655398

KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Polymers, Silicon, Coating, Lithography, 193nm lithography, Reflectivity, Absorbance

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Proceedings Article | 29 March 2006 Paper

Paper

New chemical approach for resist poisoning problem in via first dual-damascene process

Hajime Nakao, Satoshi Takei, Tetsuya Shinjo, Yasuyuki Nakajima

Proceedings Volume 6153, 61532O (2006) https://doi.org/10.1117/12.655529

KEYWORDS: Contamination, Photoresist processing, Lithography, Chemical reactions, Annealing, Diffusion, Semiconducting wafers, Silicon, Cadmium sulfide, Polymers

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Proceedings Article | 4 May 2005 Paper

Paper

ARC and gap fill material with high etch rate for advanced dual damascene process

Tetsuya Shinjo, Satoshi Takei, Yasushi Sakaida, Anwei Qin, Yasuyuki Nakajima

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599249

KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Silicon, Reflectivity, Coating, Lithography, Copper, Polymers, Dielectrics

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Proceedings Article | 14 May 2004 Paper

Paper

Thin film and high-etch-rate type 248-nm bottom antireflective coatings

Tomoyuki Enomoto, Satoshi Takei, Takahiro Kishioka, Tadashi Hatanaka, Rikimaru Sakamoto, Yasuyuki Nakajima

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534653

KEYWORDS: Reflectivity, Photoresist materials, Etching, Silicon, Semiconducting wafers, Plasma etching, Oxides, Bottom antireflective coatings, Thin films, Reflection

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Proceedings Article | 14 May 2004 Paper

Paper

Developer-soluble gap fill materials for patterning metal trenches in via-first dual damascene process

Mandar Bhave, Kevin Edwards, Carlton Washburn, Satoshi Takei, Yasushi Sakaida, Yasuyuki Nakajima

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534338

KEYWORDS: Semiconducting wafers, Etching, Lithography, Standards development, Reactive ion etching, Optical lithography, Metals, Polymers, Photoresist materials, Materials processing

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Proceedings Article | 24 August 2001 Paper

Paper

Development of full-fill bottom antireflective coatings for dual-damascene process

Yubao Wang, Xiaoming Wu, Gu Xu, James Lamb, John Sullivan, James Claypool, Jackie Backus, Sean Trautman, Xie Shao, Satoshi Takei, Yasuhisa Sone, Kenichi Mizusawa, Hiroyoshi Fukuro

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436917

KEYWORDS: Coating, Etching, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings, Antireflective coatings, Lithography, Thin films, Critical dimension metrology, Deep ultraviolet

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Showing 5 of 58 publications

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