New polymer platform of BARC for ArF lithography

Yoshiomi Hiroi; Takahiro Kishioka; Rikimaru Sakamoto; Daisuke Maruyama; Yasushi Sakaida; Takashi Matsumoto; Yasuyuki Nakajima; SangMun Chon; YoungHo Kim; Sangwoong Yoon; Seok Han; YoungHoon Kim; EunYoung Yoon

doi:10.1117/12.599421

4 May 2005 New polymer platform of BARC for ArF lithography

Yoshiomi Hiroi, Takahiro Kishioka, Rikimaru Sakamoto, Daisuke Maruyama, Yasushi Sakaida, Takashi Matsumoto, Yasuyuki Nakajima, SangMun Chon, YoungHo Kim, Sangwoong Yoon, Seok Han, YoungHoon Kim, EunYoung Yoon

Author Affiliations +

Proceedings Volume 5753, Advances in Resist Technology and Processing XXII; (2005) https://doi.org/10.1117/12.599421
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We found a new polymer platform for ArF BARC that can be prepared by addition polymerization. This system not only improves resist pattern collapse, but also allows control of the optimum film thickness, and etch rate by combination of compounds, method of polymerization (molecular weight control), and additives. Moreover, these materials have the unique characteristic that the resist profiles change little even if the type of resist changes.

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Yoshiomi Hiroi, Takahiro Kishioka, Rikimaru Sakamoto, Daisuke Maruyama, Yasushi Sakaida, Takashi Matsumoto, Yasuyuki Nakajima, SangMun Chon, YoungHo Kim, Sangwoong Yoon, Seok Han, YoungHoon Kim, and EunYoung Yoon "New polymer platform of BARC for ArF lithography", Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, (4 May 2005); https://doi.org/10.1117/12.599421

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