Dr. Sangwoong Yoon Profile

Dr. Sangwoong Yoon

at Samsung Electronics Co Ltd

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Author

Publications (8)

Proceedings Article | 28 June 2005 Paper

ArF photoresist parameter optimization for mask error enhancement factor reduction

Ji Lee, Tae Kim, Seok Han, Sangwoong Yoon, Young Kim, Chang Lee, Hye Kang, Hyun Oh, Hye-Keun Oh, Kyoung Park

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617210

KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties

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Proceedings Article | 4 May 2005 Paper

New polymer platform of BARC for ArF lithography

Yasuyuki Nakajima, YoungHo Kim, Takashi Matsumoto, Rikimaru Sakamoto, Yasushi Sakaida, Takahiro Kishioka, YoungHoon Kim, Sangwoong Yoon, Yoshiomi Hiroi, EunYoung Yoon, Daisuke Maruyama, SangMun Chon, Seok Han

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599421

KEYWORDS: Etching, Polymers, Lithography, Reflectivity, Semiconducting wafers, Silicon, Sensors, Polymerization, Control systems, Photoresist materials

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Proceedings Article | 14 May 2004 Paper

Analysis of solvent effect to control the BARC coating uniformity

Boo Deuk Kim, Young Hoon Kim, Eun-Soon Chung, Hong Lee, Myungsun Kim, Young Ho Kim, Min-Ho Jung, Beom-Sang Yoo, Don Winning, Do Young Kim, Sang-Mun Chon, Jeong Yun Ya, Sangwoong Yoon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533924

KEYWORDS: Coating, Humidity, Polymers, Statistical modeling, Control systems, Reflectivity, Photoresist materials, Manufacturing, Chemistry, Inspection

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Proceedings Article | 14 May 2004 Paper

Influence of activation energy on LER in chemically amplified KrF photoresists

Won Mi Kim, Young Ho Kim, Sang-Mun Chon, Kyung-Mee Kim, Seok Bong Park, Sang Sik Moon, Chang Ho Lee, Jae Hyun Kim, Shi Yong Lee, Sangwoong Yoon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533880

KEYWORDS: Diffusion, Photoresist materials, Line edge roughness, Polymers, Atomic force microscopy, Temperature metrology, Scanning electron microscopy, Photoresist developing, Lithography, Glasses

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Proceedings Article | 14 May 2004 Paper

Impact of BARC on SEM shrinkage of ArF resist

Kyung-Mee Kim, Sang-Gyun Woo, Hyun-Woo Kim, Shi Yong Lee, Sangwoong Yoon, Jae Hyun Kim, Takahiro Kishioka, Sang-Mun Chon, Yasuhisa Sone, Myungsun Kim, Yasuyuki Nakajima, Young Ho Kim

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533884

KEYWORDS: Scanning electron microscopy, Reflectivity, Critical dimension metrology, Inspection, Polymers, Silicon, Optical lithography, Time metrology, Lithography, Line edge roughness

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Proceedings Article | 14 May 2004 Paper

Influence of resin properties to resist performance at ArF lithography

Young Ho Kim, Sangwoong Yoon, Sang-Mun Chon, Boo Deuk Kim, Hong Lee, Shi Yong Lee, Jae Hyun Kim, Do Kim, Young Hoon Kim, Myungsun Kim, Kyung-Mee Kim

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533950

KEYWORDS: Line edge roughness, Lithography, Palladium, Polymers, Ultraviolet radiation, Polymerization, Manganese, Photoresist materials, Sensors, Critical dimension metrology

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Proceedings Article | 12 June 2003 Paper

Thin film type 248-nm bottom antireflective coatings

Yasuyuki Nakajima, Yong-Hoon Kim, Kenichi Mizusawa, Young-Ho Kim, Keisuke Nakayama, Tomoyuki Enomoto, Hoesik Chung, Sangwoong Yoon, Sang Mun Chon

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485060

KEYWORDS: Reflectivity, Photoresist materials, Silicon, Etching, Semiconducting wafers, Lithography, Coating, Plasma etching, Bottom antireflective coatings, Thin films

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Proceedings Article | 23 June 2000 Paper

New development of cost-effective sub-0.18-um lithography with i-line

KwangSoek Choi, Youngsun Kim, Jinhang Jung, JeEung Park, Sangwoong Yoon, Hoesik Chung, NamHee Yoo

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388334

KEYWORDS: Ultraviolet radiation, Lithography, Photoresist processing, Critical dimension metrology, Deep ultraviolet, Phase shifts, Photomasks, Photoresist materials, Defect detection, Scanning electron microscopy

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Showing 5 of 8 publications

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