Paper
5 January 2006 A new investigation of high-frequency thermopile response
Shu-Jung Chen, Chih-Hsiung Shen
Author Affiliations +
Proceedings Volume 6035, Microelectronics: Design, Technology, and Packaging II; 603518 (2006) https://doi.org/10.1117/12.640254
Event: Microelectronics, MEMS, and Nanotechnology, 2005, Brisbane, Australia
Abstract
In this paper, we present a complete electrothermal study of a micromachined active thermopile for frequency and transient response. The work has been carried out combining Fourier, Laplace transfromtion with the experimental measurements and finally give a electrothermal modeling. Device parameters of thermal microsensors are essential for evaluating the sensor performances and their simulation modeling. A considerable number of measurements for microsensors and system characterizations rely on the analysis of its step response. The behavior on spectrum domain and time domain are predicted and been proved by our experiments. A new investigation of high frequency response for CMOS compatible thermoelectric infrared sensors is proposed and fabricated. The sensors are fabricated by an 1.2 μm industrial CMOS IC technologies combined with a subsequent anisotropic front-side etching stop. It consists of a heating polysilicon resistor and an Al / n-polysilicon thermopile, embedded in an oxide/nitride membrane. High frequency response of test sample shows unexpected large signal, which is quite interesting and never reported before. To analyze the transient response, we build an electrothermal model for our test thermopile. The equivalent electrical circuitry has been built to simulate the operation of micromachined thermopile when radiation power comes. We have made a thoroughly measurement and analysis, and given some interesting results.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shu-Jung Chen and Chih-Hsiung Shen "A new investigation of high-frequency thermopile response", Proc. SPIE 6035, Microelectronics: Design, Technology, and Packaging II, 603518 (5 January 2006); https://doi.org/10.1117/12.640254
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Sensors

Microsensors

Infrared sensors

Infrared radiation

Etching

Silicon

CMOS sensors

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