Building a computational model for process and proximity compensation

Gökhan Perçin; Hsu-Ting Huang; Franz X. Zach; Apo Sezginer; Ali Mokhberi

doi:10.1117/12.656501

20 March 2006 Building a computational model for process and proximity compensation

Gökhan Perçin, Hsu-Ting Huang, Franz X. Zach, Apo Sezginer, Ali Mokhberi

Proceedings Volume 6154, Optical Microlithography XIX; 61543N (2006) https://doi.org/10.1117/12.656501
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Computational models used in process proximity correction require accurate description of lithography and etch processes. We present inversion of stepper and photoresist parameters from printed test structures. The technique is based on printing a set of test structures at different dose and defocus settings, and processing the CD-SEM measurements of the printed test structures. The model of image formation includes: an arbitrary pupil illumination profile, defocus bias, flare, chromatic aberrations, wavefront errors and apodization of the lens pupil; interaction of vector EM waves with the stack of materials on the wafer; and molecular diffusion in photoresist. The inversion is done by minimizing a norm of the differences between CDs calculated by the model and CD-SEM measurements. The corresponding non-linear least square problem is solved using Gauss-Newton and Levenberg-Marquardt algorithms. Differences between the CD measurements and the best fitting model have an RMS error of 1.63 nm. An etch model, separate from the lithography model, is fitted to measurements of etch skew.

Citation Download Citation

Gökhan Perçin, Hsu-Ting Huang, Franz X. Zach, Apo Sezginer, and Ali Mokhberi "Building a computational model for process and proximity compensation", Proc. SPIE 6154, Optical Microlithography XIX, 61543N (20 March 2006); https://doi.org/10.1117/12.656501

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available