Correcting lithography hot spots during physical-design implementation

Gerard T. Luk-Pat; Alexander Miloslavsky; Atsuhiko Ikeuchi; Hiroaki Suzuki; Suigen Kyoh; Kyoko Izuha; Frank Tseng; Linni Wen

doi:10.1117/12.692865

20 October 2006 Correcting lithography hot spots during physical-design implementation

Gerard T. Luk-Pat, Alexander Miloslavsky, Atsuhiko Ikeuchi, Hiroaki Suzuki, Suigen Kyoh, Kyoko Izuha, Frank Tseng, Linni Wen

Author Affiliations +

Proceedings Volume 6349, Photomask Technology 2006; 634920 (2006) https://doi.org/10.1117/12.692865
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

As the technology node shrinks, printed-wafer shapes show progressively less similarity to the design-layout shapes, even with optical proximity correction (OPC). Design tools have a restricted ability to address this shape infidelity. Their understanding of lithography effects is limited, taking the form of design rules that try to prevent "Hot Spots" - locations that demonstrate wafer-printing problems. These design rules are becoming increasingly complex and therefore less useful in addressing the lithography challenges. Therefore, design tools that have a better understanding of lithography are becoming a necessity for technology nodes of 65 nm and below. The general goal of this work is to correct lithography Hot Spots during physical-design implementation. The specific goal is to automatically fix a majority of the Hot Spots in the Metal 2 layers and above, with a run time on the order of a few hours per layer. Three steps were taken to achieve this goal. First, Hot Spot detection was made faster by using rule-based detection. Second, Hot Spot correction was automated by using rule-based correction. Third, convergence of corrections was avoided by performing correction locally, which means that correcting one Hot Spot was very unlikely to create new Hot Spots.

Citation Download Citation

Gerard T. Luk-Pat, Alexander Miloslavsky, Atsuhiko Ikeuchi, Hiroaki Suzuki, Suigen Kyoh, Kyoko Izuha, Frank Tseng, and Linni Wen "Correcting lithography hot spots during physical-design implementation", Proc. SPIE 6349, Photomask Technology 2006, 634920 (20 October 2006); https://doi.org/10.1117/12.692865

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