Distribution control of protecting groups and its effect on LER for EUV molecular resist

Daiju Shiono; Hideo Hada; Hiroto Yukawa; Hiroaki Oizumi; Iwao Nishiyama; Kyoko Kojima; Hiroshi Fukuda

doi:10.1117/12.711311

12 April 2007 Distribution control of protecting groups and its effect on LER for EUV molecular resist

Daiju Shiono, Hideo Hada, Hiroto Yukawa, Hiroaki Oizumi, Iwao Nishiyama, Kyoko Kojima, Hiroshi Fukuda

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65193U (2007) https://doi.org/10.1117/12.711311
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

We have designed and synthesized a molecular resist material, which has no distribution of the protecting groups and have evaluated its performance as a molecular resist with EB and EUV exposure tool. The molecular resist attained a resolution of sub-45 nm patterning at an exposure dose of 12 mJ/cm². It was found that controlling the distribution of the protecting groups in a molecular resist material has a great impact on improving Line Edge Roughness (LER). Low LER values of 3.1 nm (inspection length: L = 620 nm) and 3.6 nm (L = 2000 nm) were achieved with this molecular resist using Extreme UltraViolet (EUV) lithography tool.

Citation Download Citation

Daiju Shiono, Hideo Hada, Hiroto Yukawa, Hiroaki Oizumi, Iwao Nishiyama, Kyoko Kojima, and Hiroshi Fukuda "Distribution control of protecting groups and its effect on LER for EUV molecular resist", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65193U (12 April 2007); https://doi.org/10.1117/12.711311

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