CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 7405 > Article
Paper
21 August 2009 A decade of commitment from the NIST Manufacturing Engineering Laboratory to nanomanufacturing and nanometrology
Kevin W. Lyons, Michael T. Postek
Author Affiliations +
Proceedings Volume 7405, Instrumentation, Metrology, and Standards for Nanomanufacturing III; 740503 (2009) https://doi.org/10.1117/12.828307
Event: SPIE NanoScience + Engineering, 2009, San Diego, California, United States
Abstract
Advanced research in nanomanufacturing technologies and processes has continued at an accelerating rate over the past decade. Profitable niche applications such as the use of carbon nanotubes for improving battery performance and nanoparticle-enhanced chemical-mechanical polishing slurries, and the anticipation of the overall impact that nanotechnologies will provide for society, have continued to fuel interest and funding for nanomanufacturing. The National Institute of Standards and Technology (NIST) Manufacturing Engineering Laboratory (MEL) recognized the importance of nanotechnologies for U.S. industries and participated in a number of nanomanufacturing-relevant activities as early as 1999. This included numerous leadership roles regarding nanotechnologies, nanomanufacturing and nanometrology. Work at NIST in collaboration with other agencies influenced the direction of U.S. nanomanufacturing research and development. In October 2000, NIST MEL created the first Nanomanufacturing Program in order to draw interest in this growing field. Since then, the NIST MEL work in nanomanufacturing has included measurement projects that spanned nano- to micro-scale dimensions with key device or product functionality resulting from the nanometer scale features. This paper provides an overview of activities that have propelled NIST MEL to its current leadership position. The paper describes key research conducted by the MEL over the past decade as well as on-going research in nanomanufacturing and nanometrology.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Kevin W. Lyons and Michael T. Postek "A decade of commitment from the NIST Manufacturing Engineering Laboratory to nanomanufacturing and nanometrology", Proc. SPIE 7405, Instrumentation, Metrology, and Standards for Nanomanufacturing III, 740503 (21 August 2009); https://doi.org/10.1117/12.828307
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 18 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Manufacturing
Nanotechnology
Standards development
Metrology
Nanolithography
Nanomaterials
Carbon nanotubes
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top