Paper
31 December 2009 Ultrafast photoluminescence as a diagnostic for laser damage initiation
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Abstract
Using high-sensitivity confocal time-resolved photoluminescence (CTP) techniques, we report an ultra-fast photoluminescence (40ps-5ns) from impurity-free surface flaws on fused silica, including polished, indented or fractured surfaces of fused silica, and from laser-heated evaporation pits. This fast photoluminescence (PL) is not associated with slower point defect PL in silica which has characteristic decay times longer than 5ns. Fast PL is excited by the single photon absorption of sub-band gap light, and is especially bright in fractures. Regions which exhibit fast PL are strongly absorptive well below the band gap, as evidenced by a propensity to damage with 3.5eV ns-scale laser pulses, making CTP a powerful non-destructive diagnostic for laser damage in silica. The use of CTP to provide insights into the nature of damage precursors and to help develop and evaluate new damage mitigation strategies will be presented.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ted A. Laurence, Jeff D. Bude, Nan Shen, Phillip E. Miller, William A. Steele, Gabe Guss, John J. Adams, Lana L. Wong, Michael D. Feit, and Tayyab I. Suratwala "Ultrafast photoluminescence as a diagnostic for laser damage initiation", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 750416 (31 December 2009); https://doi.org/10.1117/12.836923
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Cited by 7 scholarly publications.
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KEYWORDS
Silica

Laser induced damage

Luminescence

Pulsed laser operation

Absorption

Carbon dioxide lasers

Laser damage threshold

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