Performance improvements of binary diffractive structures via optimization of the photolithography and dry etch processes

Kevin Welch; Jerry Leonard; Richard D. Jones

doi:10.1117/12.859893

16 August 2010 Performance improvements of binary diffractive structures via optimization of the photolithography and dry etch processes

Kevin Welch, Jerry Leonard, Richard D. Jones

Author Affiliations +

Proceedings Volume 7789, Laser Beam Shaping XI; 778906 (2010) https://doi.org/10.1117/12.859893
Event: SPIE Optical Engineering + Applications, 2010, San Diego, California, United States

Abstract

Increasingly stringent requirements on the performance of diffractive optical elements (DOEs) used in wafer scanner illumination systems are driving continuous improvements in their associated manufacturing processes. Specifically, these processes are designed to improve the output pattern uniformity of off-axis illumination systems to minimize degradation in the ultimate imaging performance of a lithographic tool. In this paper, we discuss performance improvements in both photolithographic patterning and RIE etching of fused silica diffractive optical structures. In summary, optimized photolithographic processes were developed to increase critical dimension uniformity and featuresize linearity across the substrate. The photoresist film thickness was also optimized for integration with an improved etch process. This etch process was itself optimized for pattern transfer fidelity, sidewall profile (wall angle, trench bottom flatness), and across-wafer etch depth uniformity. Improvements observed with these processes on idealized test structures (for ease of analysis) led to their implementation in product flows, with comparable increases in performance and yield on customer designs.

Citation Download Citation

Kevin Welch, Jerry Leonard, and Richard D. Jones "Performance improvements of binary diffractive structures via optimization of the photolithography and dry etch processes", Proc. SPIE 7789, Laser Beam Shaping XI, 778906 (16 August 2010); https://doi.org/10.1117/12.859893

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available