Focus control budget analysis for critical layers of flash devices

Jong Hoon Jang; Tony Park; Kyeong Dong Park; Jong Hyun Hwang; Jin Phil Choi; Young Seog Kang

doi:10.1117/12.2046235

2 April 2014 Focus control budget analysis for critical layers of flash devices

Jong Hoon Jang, Tony Park, Kyeong Dong Park, Jong Hyun Hwang, Jin Phil Choi, Young Seog Kang

Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 90502F (2014) https://doi.org/10.1117/12.2046235
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

As design rule shrinks down, on-product focus control became more important since available depth of focus (DOF) is getting narrower and also required critical dimension uniformity (CDU) becomes tighter. Thus monitoring, control the scanner focus error and reducing the focus control budget of scanner are essential for the production. There are some critical layers which has so narrow DOF margin that hardly be processed on old model scanners. Our study mainly focused on the analysis of the scanner focus control budget of such layers. Among the contributors to the focus budget, inter-field focus uniformity was turned out to be the most dominant. Leveling accuracy and intra-field focus uniformity were also dominant.

Citation Download Citation

Jong Hoon Jang, Tony Park, Kyeong Dong Park, Jong Hyun Hwang, Jin Phil Choi, and Young Seog Kang "Focus control budget analysis for critical layers of flash devices", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502F (2 April 2014); https://doi.org/10.1117/12.2046235

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