Aberration functions expanding in Zernike polynomial for lithographic lens

Huang Yang; Hongwei Zhu; Tingwen Xing

doi:10.1117/12.2068275

18 September 2014 Aberration functions expanding in Zernike polynomial for lithographic lens

Huang Yang, Hongwei Zhu, Tingwen Xing

Proceedings Volume 9282, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 928233 (2014) https://doi.org/10.1117/12.2068275
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China

Abstract

For characteristic of a lithographic lens, wide field, a series of coefficients of Zernike polynomial cannot express the characteristic of aberration of the whole system．In this paper, we relate coefficient of Zernike polynomial to field coordinates by introducing double Zernike polynomial to represent field dependent aberrations of lithographic lens. The new aberration function is a sum of some four dimensions polynomial, which consist of fringe Zernike of pupil coordinates and field coordinates. We emulate the manufacturing error of lithographic lens by code V, a software of optical design, and fit a set of double Zernike polynomial coefficients by using single Zernike coefficients of a lot of field points to represent the global aberration of lithographic lens.

Citation Download Citation

Huang Yang, Hongwei Zhu, and Tingwen Xing "Aberration functions expanding in Zernike polynomial for lithographic lens", Proc. SPIE 9282, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 928233 (18 September 2014); https://doi.org/10.1117/12.2068275

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