Directly patternable dielectric based on fluorinated polyimide

Andrew R. Dick; William K. Bell; Brendan Luke; Erin Maines; Brennan Mueller; Paul A. Kohl; Brandon Rawlings; C. Grant Willson

doi:10.1117/12.2085793

20 March 2015 Directly patternable dielectric based on fluorinated polyimide

Andrew R. Dick, William K. Bell, Brendan Luke, Erin Maines, Brennan Mueller, Paul A. Kohl, Brandon Rawlings, C. Grant Willson

Author Affiliations +

Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 94251D (2015) https://doi.org/10.1117/12.2085793
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

A photosensitive polyimide system based on amine catalyzed imidization of a precursor poly(amic ester) is described. The material is based on the meta ethyl ester of pyromellitic dianhydride and 2,2’ bis(trifluoromethyl)benzidine and acts as a negative tone resist when formulated with a photobase generator. The material exhibits a dielectric constant of 3.0 in the GHz range, a coefficient of thermal expansion of 6±2 ppm/K, and can be patterned to aspect ratios of greater than 2 when formulated with a high efficiency cinnamide type photobase generator.

Citation Download Citation

Andrew R. Dick, William K. Bell, Brendan Luke, Erin Maines, Brennan Mueller, Paul A. Kohl, Brandon Rawlings, and C. Grant Willson "Directly patternable dielectric based on fluorinated polyimide", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251D (20 March 2015); https://doi.org/10.1117/12.2085793

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