Surface treatment of polyimide film for metal magnetron deposition in vacuum

V. Petrov; D. Vertyanov; S. Timoshenkov; V. Nikolaev

doi:10.1117/12.2180420

18 December 2014 Surface treatment of polyimide film for metal magnetron deposition in vacuum

V. Petrov, D. Vertyanov, S. Timoshenkov, V. Nikolaev

Proceedings Volume 9440, International Conference on Micro- and Nano-Electronics 2014; 94400A (2014) https://doi.org/10.1117/12.2180420
Event: The International Conference on Micro- and Nano-Electronics 2014, 2014, Zvenigorod, Russian Federation

Abstract

This paper brings forward a solution for acquisition of good quality metallization layers on the polyimide substrate by magnetron deposition in vacuum environment. Different film type structures have been analyzed after refining and activation surface treatment operations. Positive effect was shown after the application of polyimide lacquer for surface dielectric film planarization and for structural defects elimination.

Citation Download Citation

V. Petrov, D. Vertyanov, S. Timoshenkov, and V. Nikolaev "Surface treatment of polyimide film for metal magnetron deposition in vacuum", Proc. SPIE 9440, International Conference on Micro- and Nano-Electronics 2014, 94400A (18 December 2014); https://doi.org/10.1117/12.2180420

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