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30 April 2023 EUV phase monitoring applications with actinic reflectometry
Stuart Sherwin, Eric Gullikson, Matt Hettermann, Dave Houser, Chami Perera, Patrick Naulleau
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Proceedings Volume PC12494, Optical and EUV Nanolithography XXXVI; PC1249408 (2023) https://doi.org/10.1117/12.2662135
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
With the coming adoption of EUV phase shift absorbers in high-volume manufacturing, it soon will be critical to ensure phase uniformity across the mask and stability over time. Synchrotron-based EUV variable angle spectroscopic reflectometry has been demonstrated to be a highly sensitive metrology technique for the measurement of phase. More recently, this phase measurement technique has been successfully implemented as a fab-scale tool based on a laser produced plasma source. The metrology enabled by this tool supports the continual monitoring of phase stability in a manufacturing environment, which can provide invaluable knowledge about best practices for mitigating or reversing phase drift resulting from effects such as contamination and mask aging. In this presentation we report on such phase drift measurements on real EUV masks looking at various sources of phase change on the mask.
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Stuart Sherwin, Eric Gullikson, Matt Hettermann, Dave Houser, Chami Perera, and Patrick Naulleau "EUV phase monitoring applications with actinic reflectometry", Proc. SPIE PC12494, Optical and EUV Nanolithography XXXVI, PC1249408 (30 April 2023); https://doi.org/10.1117/12.2662135
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KEYWORDS
Extreme ultraviolet
Phase measurement
Reflectometry
Metrology
Photomasks
Reflectance spectroscopy
Phase shifts
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