Mr. Chami Perera Profile

Chami Perera

COO at EUV Tech

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 22 November 2023 Presentation

EUV actinic scatterometry for in-pattern phase metrology

Stuart Sherwin, Matt Hettermann, Dave Houser, Chami Perera, Patrick Naulleau

Proceedings Volume PC12751, PC127510P (2023) https://doi.org/10.1117/12.2688099

KEYWORDS: Phase shifts, Extreme ultraviolet, Metrology, Scatterometry, Phase measurement, Near field, Light scattering, Laser scattering, Attenuation, 3D mask effects

Read Abstract +

Proceedings Article | 21 November 2023 Presentation + Paper

Development of EUV phase shift mask metrology

Elba Gomar-Nadal, Malahat Tavassoli, Kowtilya Bijjula, Stuart Sherwin, Matt Hettermann, Christian Wilson, Feng Dong, Dave Houser, Alexander Khodarev, Chami Perera, Patrick Naulleau

Proceedings Volume 12751, 127510O (2023) https://doi.org/10.1117/12.2688453

KEYWORDS: Phase shifts, Extreme ultraviolet, Metrology, Reflectance spectroscopy, Reflectometry, Spectroscopy, Signal attenuation, Refractive index, Phase measurement, Thin films

Read Abstract +

Proceedings Article | 30 April 2023 Presentation

EUV phase monitoring applications with actinic reflectometry

Stuart Sherwin, Eric Gullikson, Matt Hettermann, Dave Houser, Chami Perera, Patrick Naulleau

Proceedings Volume PC12494, PC1249408 (2023) https://doi.org/10.1117/12.2662135

KEYWORDS: Extreme ultraviolet, Reflectometry, Phase measurement, Photomasks, Metrology, Reflectance spectroscopy, Spectroscopy, Scatterometry, Plasma, Phase shifts

Read Abstract +

Proceedings Article | 15 September 2022 Presentation

Development of a standalone zoneplate based EUV mask defect review tool

Chami Perera

Proceedings Volume PC12325, PC1232503 (2022) https://doi.org/10.1117/12.2656116

Read Abstract +

Proceedings Article | 13 June 2022 Presentation

Development of a standalone zoneplate based EUV mask defect review tool

Chami Perera, Gi Sung Yoon, Ryan Carlson, Baorui Yang, Mike Hermes, Dave Houser, Alexander Khodarev, Chuck Murray, Travis Grodt, Arnaud Allézy, Weilun Chao, Farhad Salmassi, Eric Gullikson, Patrick Naulleau

Proceedings Volume PC12051, PC120510E (2022) https://doi.org/10.1117/12.2617277

KEYWORDS: Extreme ultraviolet, Photomasks, Reticles, Microscopes, Imaging systems, Zone plates, Semiconductors, Semiconducting wafers, Patents, Metrology

Read Abstract +

Proceedings Article | 7 November 2018 Presentation

EUV mask and pellicle metrology for high-volume manufacturing (Conference Presentation)

Rupert Perera

Proceedings Volume 10810, 1081019 (2018) https://doi.org/10.1117/12.2502931

KEYWORDS: Extreme ultraviolet, Pellicles, Photomasks, Metrology, Extreme ultraviolet lithography, High volume manufacturing, Inspection, Reflectometry, Lithography, Scanners

Read Abstract +

SPIE Journal Paper | 12 September 2018

Need for LWR metrology standardization: the imec roughness protocol

Gian Francesco Lorusso, Takumichi Sutani, Vito Rutigliani, Frieda van Roey, Alain Moussa, Anne-Laure Charley, Chris Mack, Patrick Naulleau, Chami Perera, Vassilios Constantoudis, Masami Ikota, Toru Ishimoto, Shunsuke Koshihara

JM3, Vol. 17, Issue 04, 041009, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041009

KEYWORDS: Metrology, Line width roughness, Scanning electron microscopy, Digital filtering, Atomic force microscopy, Standards development, Semiconductors, Image acquisition, Image quality, Electron microscopes

Read Abstract +

As semiconductor technology keeps moving forward, undeterred by the many challenges ahead, one specific deliverable is capturing the attention of many experts in the field: line width roughness (LWR) specifications are expected to be <2 nm in the near term, and to drop below 1 nm in just a few years. This is a daunting challenge and engineers throughout the industry are trying to meet these targets using every means at their disposal. However, although current efforts are surely admirable, we believe they are not enough. The fact is that a specification has a meaning only if there is an agreed methodology to verify if the criterion is met or not. Such standardization is critical in any field of science and technology and the question that we need to ask ourselves today is whether we have a standardized LWR metrology or not. In other words, if a single reference sample were provided, would everyone measuring it get reasonably comparable results? We came to realize that this is not the case and that the observed spread in the results throughout the industry is quite large. In our opinion, this makes the comparison of LWR data among institutions, or to a specification, very difficult. We report the spread of measured LWR data across the semiconductor industry. We investigate the impact of image acquisition, measurement algorithm, and frequency analysis parameters on LWR metrology. We review critically some of the International Technology Roadmap for Semiconductors (ITRS) metrology guidelines [such as measurement box length >2 μm and the need to correct for scanning electron microscope (SEM) noise]. We compare the SEM roughness results to AFM measurements. Finally, we propose a standardized LWR measurement protocol—the imec roughness protocol—intended to ensure that every time LWR measurements are compared (from various sources or to specifications), the comparison is sensible and sound. We deeply believe that the industry is at a point where it is imperative to guarantee that when talking about a critical parameter such as LWR, everyone speaks the same language, which is not currently the case.

Proceedings Article | 4 September 2015 Paper

Challenges in constructing EUV metrology tools to qualify the EUV masks for HVM implementation

David Houser, Feng Dong, Chami Perera, Rupert Perera

Proceedings Volume 9661, 96610K (2015) https://doi.org/10.1117/12.2196727

KEYWORDS: Extreme ultraviolet, Photomasks, Reflectivity, Pellicles, Extreme ultraviolet lithography, Metrology, Reflectometry, Lithography, Sensors, Particles

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years