High-NA stitching: how to evaluate performance?

Natalia Davydova; Airat Galiullin; Cyrus Tabery; Bram Slachter; Adam Lyons; Jeremy Chen; Nick Pellens; Vincent Wiaux; Tatiana Kovalevich; Lieve van Look; Ataklti Weldeslassie; Joost Bekaert

doi:10.1117/12.3038962

13 November 2024 High-NA stitching: how to evaluate performance?

Natalia Davydova, Airat Galiullin, Cyrus Tabery, Bram Slachter, Adam Lyons, Jeremy Chen, Nick Pellens, Vincent Wiaux, Tatiana Kovalevich, Lieve van Look, Ataklti Weldeslassie, Joost Bekaert

Author Affiliations +

Proceedings Volume PC13215, International Conference on Extreme Ultraviolet Lithography 2024; PC132150A (2024) https://doi.org/10.1117/12.3038962
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

High NA anamorphic EUV scanner has anamorphic optics with 8x demagnification in y direction and thus twice smaller exposure fields 26x16.5 mm2. In-die stitching may be required in order to create dies larger than High NA exposure field. In this work we consider stitching of vertical lines and spaces (LS) and establish methodology of stitching evaluation including detailed contour metrology at stitch, across wafer performance, process window and contrast metrics and sensitivity to single layer overlay between two stitched fields.

Conference Presentation

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Natalia Davydova, Airat Galiullin, Cyrus Tabery, Bram Slachter, Adam Lyons, Jeremy Chen, Nick Pellens, Vincent Wiaux, Tatiana Kovalevich, Lieve van Look, Ataklti Weldeslassie, and Joost Bekaert "High-NA stitching: how to evaluate performance?", Proc. SPIE PC13215, International Conference on Extreme Ultraviolet Lithography 2024, PC132150A (13 November 2024); https://doi.org/10.1117/12.3038962

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