Dr. Lieve van Look Profile

Dr. Lieve van Look

Researcher at imec

SPIE Involvement:

Author

Publications (53)

Proceedings Article | 13 November 2024 Presentation

Presentation

High-NA stitching: how to evaluate performance?

Natalia Davydova, Airat Galiullin, Cyrus Tabery, Bram Slachter, Adam Lyons, Jeremy Chen, Nick Pellens, Vincent Wiaux, Tatiana Kovalevich, Lieve van Look, Ataklti Weldeslassie, Joost Bekaert

Proceedings Volume PC13215, PC132150A (2024) https://doi.org/10.1117/12.3038962

KEYWORDS: Scanners, Semiconducting wafers, Scanning electron microscopy, Photomasks, Overlay metrology, Optical proximity correction, Metrology, Image processing, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 18 September 2024 Paper

Paper

High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

Joost Bekaert, Balakumar Baskaran, Lieve Van Look, Joern-Holger Franke, Vicky Philipsen, Ardavan Niroomand, Eric Hendrickx, Hideaki Komami, Tatsuro Okawa, Soichi Shida, Shinichi Kojima, Toshimichi Iwai

Proceedings Volume 13273, 132730S (2024) https://doi.org/10.1117/12.3029528

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Metrology, Scanning electron microscopy, Smoothing, Extreme ultraviolet lithography, Scanners, Design, Printing

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Proceedings Article | 26 August 2024 Paper

Paper

High NA EUV stitching: mask performance is a key

Natalia Davydova, Vincent Wiaux, Nick Pellens, Tatiana Kovalevich, Laura Huddleston, Frank Timmermans, Cyrus Tabery, Joost Bekaert, Lieve van Look, Alberto Colina, Bram Slachter, Nitesh Pandey, Stefan Hunsche, Ataklti Weldeslassie, Guillaume Libeert

Proceedings Volume 13177, 131770F (2024) https://doi.org/10.1117/12.3034393

KEYWORDS: Reflectivity, Optical proximity correction, Critical dimension metrology, Reflection, Light sources and illumination, Semiconducting wafers, Tantalum, Design, 3D mask effects, Scanners

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Proceedings Article | 26 August 2024 Paper

Paper

Imaging evaluation of low reflectivity low-n EUV mask for LS at 0.33NA

Tatiana Kovalevich, Nick Pellens, Guillaume Libeert, Lieve Van Look, Vicky Philipsen

Proceedings Volume 13177, 131770O (2024) https://doi.org/10.1117/12.3032310

KEYWORDS: Lithography, Extreme ultraviolet, 3D mask effects, Simulations, Semiconducting wafers

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Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

An experimental stitching study on the eve of high-NA EUV

Vincent Wiaux, Natalia Davydova, Lieve Van Look, Nick Pellens, Ataklti Weldeslassie, Guillaume Libeert, Tatiana Kovalevich, Frank Timmermans, Laura Huddleston

Proceedings Volume 12953, 129530J (2024) https://doi.org/10.1117/12.3010895

KEYWORDS: Critical dimension metrology, Reflectivity, Optical proximity correction, Light sources and illumination, Extreme ultraviolet, Design, Simulations, Scanners, Image processing, Modulation

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Proceedings Article | 21 November 2023 Presentation + Paper

Presentation + Paper

Stitching for high-NA: zooming in on CDU budget

Natalia Davydova, Lieve van Look, Ataklti Weldeslassie, Vincent Wiaux, Laura Huddleston, Bram Slachter, Nick Pellens, Frank Timmermans, Friso Wittebrood, Eelco van Setten, Daniel Wilson

Proceedings Volume 12750, 1275002 (2023) https://doi.org/10.1117/12.2687703

KEYWORDS: Critical dimension metrology, Zoom lenses, Reticles, Metrology, Image quality, Extreme ultraviolet, Stochastic processes, Statistical analysis, Semiconducting wafers, Overlay metrology

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Proceedings Article | 21 November 2023 Presentation + Paper

Presentation + Paper

Imaging validation for LS of dark field low-n vs. Ta-based absorber masks

Tatiana Kovalevich, Lieve Van Look, Alain Moussa, Joern-Holger Franke, Vicky Philipsen

Proceedings Volume 12750, 1275005 (2023) https://doi.org/10.1117/12.2687549

KEYWORDS: Printing, 3D mask effects, Extreme ultraviolet, Simulations, Reticles, Photomask technology, Optical lithography, Metals, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 29 September 2023 Paper

Paper

Reducing systematic LCDU of dense contact hole arrays on wafer via source optimization

Joern-Holger Franke, Lieve Van Look, Andreas Frommhold, Alberto Colina, Gijsbert Rispens, David Rio, Eelco van Setten, Mark Maslow

Proceedings Volume 12915, 1291508 (2023) https://doi.org/10.1117/12.2685814

KEYWORDS: EUV optics, Line width roughness, Signal intensity, Diffraction, Nanoimprint lithography, Spatial frequencies, Critical dimension metrology, Stochastic processes, Source mask optimization, Image transmission

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Proceedings Article | 28 April 2023 Presentation + Paper

Presentation + Paper

Experimental local MEEF study using programmed mask variability on hexagonal pitch 40 nm contact hole arrays

Lieve Van Look, Joern-Holger Franke, Andreas Frommhold, Alberto Colina, Gijsbert Rispens

Proceedings Volume 12494, 124940N (2023) https://doi.org/10.1117/12.2658714

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Metrology, Light sources and illumination, Diffraction, Stochastic processes, Design and modelling, Spatial frequencies

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Proceedings Article | 28 April 2023 Presentation + Paper

Presentation + Paper

Overview of stitching for high NA: imaging and overlay experimental and simulation results

Natalia Davydova, Lieve van Look, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Eelco van Setten, Bram Slachter, Laura Huddleston, Claire van Lare, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Marcel Beckers, Simon van Gorp, Cees Lambregts, Chung-Tien Li, Arthur van de Nes, Koen D'Havé, Tatiana Kovalevich, Diederik de Bruin, Stephen Hsu, Rene Carpaij

Proceedings Volume 12494, 124940Q (2023) https://doi.org/10.1117/12.2658511

KEYWORDS: Photomasks, Optical proximity correction, Reflection, Critical dimension metrology, Tantalum, Reflectivity, Metrology, Semiconducting wafers, Scanners, Reticles

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SPIE Journal Paper | 17 April 2023

Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask

Tatiana Kovalevich, Lieve Van Look, Joern-Holger Franke, Vicky Philipsen

JM3, Vol. 22, Issue 02, 024401, (April 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.024401

KEYWORDS: Printing, SRAF, Simulations, Nanoimprint lithography, Semiconducting wafers, Extreme ultraviolet, Critical dimension metrology, Metals, Extreme ultraviolet lithography, Electroluminescence

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Proceedings Article | 1 December 2022 Presentation + Paper

Presentation + Paper

Image contrast metrology for EUV lithography

Timothy Brunner, Vincent Truffert, Christopher Ausschnitt, Nicola Kissoon, Edouard Duriau, Tom Jonckers, Lieve van Look, Joern-Holger Franke

Proceedings Volume 12292, 122920A (2022) https://doi.org/10.1117/12.2640647

KEYWORDS: Photoresist processing, Metrology, Stochastic processes, Extreme ultraviolet lithography, Lithographic process control

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Proceedings Article | 11 November 2022 Presentation

Presentation

Evaluation of LS printing and general understanding of imaging with DF low-n mask

Tatiana Kovalevich, Lieve Van Look, Joern-Holger Franke, Vicky Philipsen

Proceedings Volume PC12292, PC122920M (2022) https://doi.org/10.1117/12.2644701

KEYWORDS: Photomasks, SRAF, Printing, Metals, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 1 November 2022 Paper

Paper

Spatial frequency breakdown of CD variation

Tatiana Kovalevich, Barbara Witek, Daniel Riggs, Joost Bekaert, Lieve Van Look, Mark John Maslow

Proceedings Volume 12472, 124720H (2022) https://doi.org/10.1117/12.2640808

KEYWORDS: Critical dimension metrology, Metrology, Semiconducting wafers, Photomasks, Spatial frequencies, Stochastic processes, Scanning electron microscopy, Scanners, Fourier transforms, Finite element methods

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Proceedings Article | 12 October 2021 Presentation + Paper

Presentation + Paper

Impact of mask corner rounding on pitch 40 nm contact hole variability

Lieve van Look, Werner Gillijns, Emily Gallagher

Proceedings Volume 11854, 1185406 (2021) https://doi.org/10.1117/12.2601850

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Stochastic processes, Metrology, Scanning electron microscopy, Scanners, Extreme ultraviolet lithography

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SPIE Journal Paper | 27 May 2021

Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gökay Yeğen, Par Broman

JM3, Vol. 20, Issue 02, 021005, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021005

KEYWORDS: Pellicles, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, Semiconducting wafers, Scattering, Reticles, Particles, Line width roughness

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Proceedings Article | 23 February 2021 Presentation + Paper

Presentation + Paper

CNT pellicles: imaging results of the first full-field EUV exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve Van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gokay Yeğen, Pär Broman

Proceedings Volume 11609, 116090Z (2021) https://doi.org/10.1117/12.2584724

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Proceedings Article | 13 October 2020 Presentation + Paper

Presentation + Paper

Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry

Vineet Vijayakrishnan Nair, Lieve Van Look , Remko Aubert, Eric Hendrickx

Proceedings Volume 11517, 115170O (2020) https://doi.org/10.1117/12.2572993

KEYWORDS: Scanners, Extreme ultraviolet lithography, Semiconducting wafers, Ellipsometry, EUV optics, Metrology, Calibration, Photomasks, Critical dimension metrology, Time metrology

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Proceedings Article | 29 November 2019 Presentation + Paper

Presentation + Paper

Predicting stochastic defects across the process window

Andreas Frommhold, Dorin Cerbu, Joost Bekaert, Lieve Van Look, Mark Maslow, Gijsbert Rispens, Eric Hendrickx

Proceedings Volume 11147, 1114708 (2019) https://doi.org/10.1117/12.2536898

KEYWORDS: Critical dimension metrology, Etching, Stochastic processes, Failure analysis, Optical correlators, Cadmium, Finite element methods, Inspection, Metrology, Defect detection

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Proceedings Article | 26 September 2019 Presentation + Paper

Presentation + Paper

Improving exposure latitudes and aligning best focus through pitch by curing M3D phase effects with controlled aberrations

Joern-Holger Franke, Joost Bekaert, Victor Blanco, Lieve Van Look, Felix Wahlisch, Kateryna Lyakhova, Paul van Adrichem, Mark Maslow, Guido Schiffelers, Eric Hendrickx

Proceedings Volume 11147, 111470E (2019) https://doi.org/10.1117/12.2537104

KEYWORDS: Diffraction, Extreme ultraviolet lithography, Metals, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Extreme ultraviolet, Phase modulation, Phase shift keying

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Proceedings Article | 29 August 2019 Paper

Paper

EUVL is being inserted in manufacturing in 2019: What are the mask related challenges remaining?

Kurt Ronse, Rik Jonckheere, Emily Gallagher, Vicky Philipsen, Lieve Van Look, Eric Hendrickx, Ryoung Han Kim

Proceedings Volume 11177, 111770A (2019) https://doi.org/10.1117/12.2535821

KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers, High volume manufacturing, Critical dimension metrology, Inspection, Logic

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Proceedings Article | 27 June 2019 Paper

Paper

Evaluation of local CD and placement distribution on EUV mask and its impact on wafer

Vidya Vaenkatesan, Paul van Adrichem, Marleen Kooiman, Michael Kubis, Lieve van Look , Andreas Frommhold, Emily Gallagher, DS Nam, Jan Mulkens

Proceedings Volume 11178, 1117807 (2019) https://doi.org/10.1117/12.2538243

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Metrology, Extreme ultraviolet, Stochastic processes

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Proceedings Article | 26 March 2019 Presentation + Paper

Presentation + Paper

Staggered pillar patterning using 0.33NA EUV lithography

Danilo De Simone, Romuald Blanc, Jeroen Van de Kerkhove, Amir-Hossein Tamaddon, Roberto Fallica, Lieve Van Look, Nouredine Rassoul, Frederic Lazzarino, Nadia Vandenbroeck, Pieter Vanelderen, Gian Lorusso, Frieda Van Roey, Anne-Laure Charley, Geert Vandenberghe, Kurt Ronse, Kilyoung Lee, Junghyung Lee, Sarohan Park, Chang-Moon Lim, Chan-Ha Park

Proceedings Volume 10957, 109570T (2019) https://doi.org/10.1117/12.2515170

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Extreme ultraviolet, Critical dimension metrology, Image processing, Failure analysis, Scanning electron microscopy, Image analysis

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Proceedings Article | 3 October 2018 Presentation + Paper

Presentation + Paper

Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300

Lieve Van Look , Joost Bekaert, Andreas Frommhold, Eric Hendrickx, Gijsbert Rispens, Guido Schiffelers

Proceedings Volume 10809, 108090M (2018) https://doi.org/10.1117/12.2501797

KEYWORDS: Semiconducting wafers, Photomasks, Critical dimension metrology, Scanners, Stochastic processes, Scanning electron microscopy, Mirrors, Metrology, Extreme ultraviolet lithography

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Proceedings Article | 16 October 2017 Presentation

Presentation

EUV exposure tool stability at IMEC (Conference Presentation)

Vinayan Menon, Raul Pecharroman-Gallego, Lieve van Look , Eric Hendrickx, Andre van Dijk, Tom Lathouwers

Proceedings Volume 10450, 1045015 (2017) https://doi.org/10.1117/12.2281623

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Scanners, Manufacturing, High volume manufacturing, Optical lithography, Lithographic illumination, EUV optics

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Proceedings Article | 23 October 2015 Paper

Paper

Experimental validation of novel mask technology to reduce mask 3D effects

Lieve Van Look, Vicky Philipsen, Eric Hendrickx, Natalia Davydova, Friso Wittebrood, Robert de Kruif, Anton van Oosten, Junji Miyazaki, Timon Fliervoet, Jan van Schoot, Jens Timo Neumann

Proceedings Volume 9635, 96350Z (2015) https://doi.org/10.1117/12.2203124

KEYWORDS: Photomasks, Semiconducting wafers, Mirrors, Printing, Diffraction, Extreme ultraviolet, Prototyping, Nanoimprint lithography, 3D image processing, Inspection

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Proceedings Article | 4 September 2015 Paper

Paper

Experimental validation of novel EUV mask technology to reduce mask 3D effects

Lieve Van Look, Vicky Philipsen, Eric Hendrickx, Natalia Davydova, Friso Wittebrood, Robert de Kruif, Anton van Oosten, Junji Miyazaki, Timon Fliervoet, Jan van Schoot, Jens Timo Neumann

Proceedings Volume 9661, 966109 (2015) https://doi.org/10.1117/12.2195329

KEYWORDS: Photomasks, Semiconducting wafers, Mirrors, Printing, Extreme ultraviolet, Diffraction, Prototyping, Nanoimprint lithography, Inspection, 3D image processing

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Proceedings Article | 9 July 2015 Paper

Paper

Alternative EUV mask technology to compensate for mask 3D effects

Lieve Van Look, Vicky Philipsen, Eric Hendrickx, Geert Vandenberghe, Natalia Davydova, Friso Wittebrood, Robert de Kruif, Anton van Oosten, Junji Miyazaki, Timon Fliervoet, Jan van Schoot, Jens Timo Neumann

Proceedings Volume 9658, 96580I (2015) https://doi.org/10.1117/12.2197213

KEYWORDS: Photomasks, Semiconducting wafers, Mirrors, Printing, Extreme ultraviolet, Diffraction, Prototyping, Nanoimprint lithography, 3D image processing, Reflectivity

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SPIE Journal Paper | 2 July 2015

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Marco Polli, Lucia D’Urzo, Roel Gronheid, Paul Nealey

JM3, Vol. 14, Issue 03, 031204, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031204

KEYWORDS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Paper

Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van Den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Venkat Nagaswami, Lucia D'Urzo, Roel Gronheid, Paul Nealey

Proceedings Volume 9423, 94230M (2015) https://doi.org/10.1117/12.2085889

KEYWORDS: Etching, Silicon, Bridges, Scanning electron microscopy, Inspection, Diffractive optical elements, Semiconducting wafers, Thin film coatings, Defect inspection, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Paper

Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Roel Gronheid, Paulina Rincon Delgadillo, Hari Pathangi, Dieter Van den Heuvel, Doni Parnell, Boon Teik Chan, Yu-Tsung Lee, Lieve Van Look, Yi Cao, YoungJun Her, Guanyang Lin, Ryota Harukawa, Venkat Nagaswami, Lucia D'Urzo, Mark Somervell, Paul Nealey

Proceedings Volume 9049, 904905 (2014) https://doi.org/10.1117/12.2047265

KEYWORDS: Etching, Inspection, Silicon, Semiconducting wafers, Scanning electron microscopy, Defect inspection, Polymethylmethacrylate, Particles, Critical dimension metrology, Directed self assembly

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Proceedings Article | 12 April 2013 Paper

Paper

Lithography imaging control by enhanced monitoring of light source performance

Paolo Alagna, Omar Zurita, Ivan Lalovic, Nakgeuon Seong, Gregory Rechsteiner, Joshua Thornes, Koen D'havé, Lieve Van Look , Joost Bekaert

Proceedings Volume 8683, 86830S (2013) https://doi.org/10.1117/12.2013213

KEYWORDS: Semiconducting wafers, Lithography, Optical lithography, Metrology, Polarization, Light sources, Critical dimension metrology, Scanners, Control systems, Lithographic illumination

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Proceedings Article | 5 April 2012 Paper

Paper

High-speed, full 3D feature metrology for litho monitoring, matching, and model calibration with scatterometry

Hugo Cramer, Alek Chen, Fahong Li, Philippe Leray, Anne-Laure Charley, Lieve van Look, Joost Bekaert, Shaunee Cheng

Proceedings Volume 8324, 83240R (2012) https://doi.org/10.1117/12.919050

KEYWORDS: Scatterometry, Scanners, 3D modeling, Optical proximity correction, 3D metrology, Calibration, Metrology, Lithography, Scatter measurement, Scanning electron microscopy

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Proceedings Article | 23 March 2011 Paper

Paper

Scanner matching for standard and freeform illumination shapes using FlexRay

J. Bekaert, L. Van Look, K. D'havé, B. Laenens, G. Vandenberghe, P. van Adrichem, W. Shao, J. Ghan, K. Schreel, J. T. Neumann

Proceedings Volume 7973, 79731I (2011) https://doi.org/10.1117/12.881607

KEYWORDS: Scanners, Fiber optic illuminators, Semiconducting wafers, Photomasks, Reticles, Diffractive optical elements, Cadmium, Critical dimension metrology, Manufacturing, Optical lithography

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Proceedings Article | 23 March 2011 Paper

Paper

Characterization and control of dynamic lens heating effects under high volume manufacturing conditions

J. Bekaert, L. Van Look, G. Vandenberghe, P. van Adrichem, M. Maslow, J.-W. Gemmink, H. Cao, S. Hunsche, J. T. Neumann, A. Wolf

Proceedings Volume 7973, 79730V (2011) https://doi.org/10.1117/12.881609

KEYWORDS: Calibration, Semiconducting wafers, Scanners, Reticles, Monochromatic aberrations, Photomasks, HVAC controls, Manufacturing, Diffraction, Wavefronts

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Proceedings Article | 23 March 2011 Paper

Paper

Optical proximity stability control of ArF immersion clusters

Lieve Van Look, Joost Bekaert, Koen D'havé, Bart Laenens, Geert Vandenberghe, Shaunee Cheng, Koen Schreel, Jan-Willem Gemmink

Proceedings Volume 7973, 79730R (2011) https://doi.org/10.1117/12.881606

KEYWORDS: Semiconducting wafers, Scanners, Fiber optic illuminators, Critical dimension metrology, Scatterometry, Diffractive optical elements, Scanning electron microscopy, Wafer-level optics, Photomasks, Control systems

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SPIE Journal Paper | 1 January 2011

Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography

Lieve Van Look, Joost Bekaert, Bart Laenens, Geert Vandenberghe, Jan Richter, Karsten Bubke, Jan Hendrik Peters, Koen Schreel, Mircea Dusa

JM3, Vol. 10, Issue 1, 013009, (January 2011) https://doi.org/10.1117/12.10.1117/1.3541779

KEYWORDS: Pellicles, Semiconducting wafers, Critical dimension metrology, Reticles, Apodization, Lithography, Photomasks, Transmittance, Optical proximity correction, Phase shifts

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SPIE Journal Paper | 1 January 2011

Experimental verification of source-mask optimization and freeform illumination for 22-nm node static random access memory cells

Joost Bekaert, Bart Laenens, Staf Verhaegen, Lieve Van Look, Darko Trivkovic, Frederic Lazzarino, Geert Vandenberghe, Paul van Adrichem, Robert Socha, Stephen Hsu, Hua-yu Liu, Orion Mouraille, Koen Schreel, Mircea Dusa, Jörg Zimmermann, Paul Gräupner, Jens Neumann

JM3, Vol. 10, Issue 1, 013008, (January 2011) https://doi.org/10.1117/12.10.1117/1.3541778

KEYWORDS: Source mask optimization, Photomasks, Diffractive optical elements, Semiconducting wafers, Scanners, Manufacturing, Double patterning technology, Fiber optic illuminators, Optical lithography, Lithographic illumination

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SPIE Journal Paper | 1 October 2010

Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm nodes

Joost Bekaert, Lieve Van Look, Vincent Truffert, Frederic Lazzarino, Geert Vandenberghe, Mario Reybrouck, Shinji Tarutani

JM3, Vol. 9, Issue 04, 043007, (October 2010) https://doi.org/10.1117/12.10.1117/1.3524829

KEYWORDS: Photomasks, Printing, Scanning electron microscopy, Etching, Double patterning technology, Optical lithography, Semiconducting wafers, Lithography, Electroluminescence, Metals

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Proceedings Article | 22 March 2010 Paper

Paper

Litho and patterning challenges for memory and logic applications at the 22-nm node

Jo Finders, Mircea Dusa, Peter Nikolsky, Youri van Dommelen, Robert Watso, Tom Vandeweyer, Joost Beckaert, Bart Laenens, Lieve Van Look

Proceedings Volume 7640, 76400C (2010) https://doi.org/10.1117/12.848330

KEYWORDS: Metals, Logic, Tolerancing, Optical lithography, Semiconducting wafers, Reticles, Double patterning technology, Photomasks, Critical dimension metrology, Lithography

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Proceedings Article | 10 March 2010 Paper

Paper

Printing the metal and contact layers for the 32- and 22-nm node: comparing positive and negative tone development process

L. Van Look, J. Bekaert, V. Truffert, V. Wiaux, F. Lazzarino, M. Maenhoudt, G. Vandenberghe, Mario Reybrouck, Shinji Tarutani

Proceedings Volume 7640, 764011 (2010) https://doi.org/10.1117/12.848228

KEYWORDS: Printing, Photomasks, Scanning electron microscopy, Optical lithography, Etching, Semiconducting wafers, Lithography, Double patterning technology, Metals, Electroluminescence

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Proceedings Article | 4 March 2010 Paper

Paper

Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography

Lieve Van Look, Joost Bekaert, Bart Laenens, Geert Vandenberghe, Jan Richter, Karsten Bubke, Jan Hendrik Peters, Koen Schreel, Mircea Dusa

Proceedings Volume 7640, 76401Y (2010) https://doi.org/10.1117/12.848219

KEYWORDS: Pellicles, Semiconducting wafers, Reticles, Lithography, Apodization, Photomasks, Transmittance, Optical proximity correction, Phase shifts, Solids

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Proceedings Article | 4 March 2010 Paper

Paper

Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells

J. Bekaert, B. Laenens, S. Verhaegen, L. Van Look, D. Trivkovic, F. Lazzarino, G. Vandenberghe, P. van Adrichem, R. Socha, S. Baron, M. C. Tsai, K. Ning, S. Hsu, H. Y. Liu, M. Mulder, A. Bouma, E. van der Heijden, O. Mouraille, K. Schreel, J. Finders, M. Dusa, J. Zimmermann, P. Gräupner, J. T. Neumann, C. Hennerkes

Proceedings Volume 7640, 764008 (2010) https://doi.org/10.1117/12.846918

KEYWORDS: Source mask optimization, Photomasks, Semiconducting wafers, Diffractive optical elements, Manufacturing, Double patterning technology, Scanners, Electroluminescence, Fiber optic illuminators, Optical lithography

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Proceedings Article | 4 December 2008 Paper

Paper

Experimental proximity matching of ArF scanners

Joost Bekaert, L. Van Look, P. De Bisschop, J. Van de Kerkhove, G, Vandenberghe, K. Schreel, J. Menger, G. Schiffelers, E. Knols, H. van der Laan, R. Willekers

Proceedings Volume 7140, 714027 (2008) https://doi.org/10.1117/12.804670

KEYWORDS: Semiconducting wafers, Scanners, Reticles, Critical dimension metrology, Optical proximity correction, Optics manufacturing, Cadmium, Photomasks, Metrology, Electroluminescence

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Proceedings Article | 19 May 2008 Paper

Paper

Separable OPC models for computational lithography

Hua-Yu Liu, Qian Zhao, J. Fung Chen, Jiong Jiang, Robert Socha, Eelco Van Setten, Andre Engelen, Jeroen Meessen, Michael Crouse, Mu Feng, Wenjin Shao, Hua Cao, Yu Cao, Lieve Van Look, Joost Bekaert, Geert Vandenberghe, Jo Finders

Proceedings Volume 7028, 70280X (2008) https://doi.org/10.1117/12.793039

KEYWORDS: 3D modeling, Optical proximity correction, Calibration, Photomasks, Data modeling, Semiconducting wafers, Performance modeling, Finite element methods, Lithography, Wafer-level optics

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Proceedings Article | 7 March 2008 Paper

Paper

Tool-to-tool optical proximity effect matching

L. Van Look, Joost Bekaert, Peter De Bisschop, Jeroen Van de Kerkhove, Geert Vandenberghe, Koen Schreel, Jasper Menger, Guido Schiffelers, Edwin Knols, Rob Willekers

Proceedings Volume 6924, 69241Q (2008) https://doi.org/10.1117/12.772598

KEYWORDS: Semiconducting wafers, Scanners, Reticles, Critical dimension metrology, Optical proximity correction, Optics manufacturing, Wafer-level optics, Cadmium, Photomasks, Solids

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Proceedings Article | 21 June 2006 Paper

Paper

Through-pitch and through-focus characterization of AAPSM for ArF immersion lithography

Toshio Konishi, Yosuke Kojima, Yoshimitsu Okuda, Vicky Philipsen, Leonardus Leunissen, Lieve Van Look

Proceedings Volume 6281, 62810S (2006) https://doi.org/10.1117/12.692802

KEYWORDS: Photomasks, Semiconducting wafers, Etching, Printing, Quartz, Immersion lithography, Chromium, Scanners, Lithography, Image enhancement

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Proceedings Article | 24 March 2006 Paper

Paper

Printability study with polarisation capable AIMS™ fab 193i to study polarisation effects

Axel Zibold, Ulrich Stroessner, Andrew Ridley, Thomas Scherübl, Norbert Rosenkranz, Wolfgang Harnisch, Eric Poortinga, Rainer Schmid, Joost Bekaert, Vicky Philipsen, Lieve Van Look, Peter Leunissen

Proceedings Volume 6152, 61522F (2006) https://doi.org/10.1117/12.656235

KEYWORDS: Polarization, Photomasks, Scanners, Reticles, Semiconducting wafers, Printing, Critical dimension metrology, Transmittance, Binary data, Polarizers

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Proceedings Article | 15 March 2006 Paper

Paper

Early learning on hyper-NA lithography using two-beam immersion interference

Eric Hendrickx, Maaike Op de Beeck, Roel Gronheid, Janko Versluijs, Lieve Van Look, Monique Ercken, Geert Vandenberghe

Proceedings Volume 6154, 61541X (2006) https://doi.org/10.1117/12.659007

KEYWORDS: Polarization, Liquids, Semiconducting wafers, Electroluminescence, Printing, Water, Prisms, Refractive index, Nanoimprint lithography, Scanners

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Proceedings Article | 5 November 2005 Paper

Paper

Image imbalance compensation in alternating phase-shift masks towards the 45nm node through-pitch imaging

Lieve Van Look, Bryan Kasprowicz, Axel Zibold, Wolfgang Degel, Geert Vandenberghe

Proceedings Volume 5992, 59921S (2005) https://doi.org/10.1117/12.632112

KEYWORDS: Etching, Chromium, Semiconducting wafers, Photomasks, Printing, Electroluminescence, Reticles, Optical proximity correction, Scanners, Manufacturing

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Proceedings Article | 5 November 2005 Paper

Paper

A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond

Martin Drapeau, Paul J. van Adrichem, Lieve van Look, Bryan Kasprowicz

Proceedings Volume 5992, 59921T (2005) https://doi.org/10.1117/12.632040

KEYWORDS: 3D modeling, Etching, Phase shifts, Photomasks, Optical proximity correction, Semiconducting wafers, Calibration, Light scattering, Critical dimension metrology, Resolution enhancement technologies

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Proceedings Article | 12 May 2005 Paper

Paper

Mask enhancer technology for 45-nm node contact hole fabrication

Takashi Yuito, Vincent Wiaux, Lieve Van Look, Geert Vandenberghe, Shigeo Irie, Takahiro Matsuo, Akio Misaka, Hisashi Watanabe, Masaru Sasago

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598977

KEYWORDS: Thin films, Photomasks, Transmittance, Printing, Lithography, Halftones, Semiconducting wafers, Critical dimension metrology, Quartz, Resolution enhancement technologies

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Proceedings Article | 28 May 2004 Paper

Paper

Optical extensions towards the 45-nm node

Eric Hendrickx, Philippe Monnoyer, Lieve Van Look, Geert Vandenberghe

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537522

KEYWORDS: Photomasks, Electroluminescence, Phase shifts, Reticles, Binary data, SRAF, Nanoimprint lithography, Semiconducting wafers, Scanners, Immersion lithography

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Showing 5 of 53 publications

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