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29 June 2012 Errata: Stochastic modeling in lithography: autocorrelation behavior of catalytic reaction-diffusion systems
Chris A. Mack
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 2, 029801 (June 2012). https://doi.org/10.1117/1.JMM.11.2.029801
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© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2012/$25.00 © 2012 SPIE
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Chris A. Mack "Errata: Stochastic modeling in lithography: autocorrelation behavior of catalytic reaction-diffusion systems," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 029801 (29 June 2012). https://doi.org/10.1117/1.JMM.11.2.029801
Published: 29 June 2012
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KEYWORDS
Lithography
Stochastic processes
Systems modeling
3D modeling
Diffusion
Point spread functions
Convolution
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