Contact holes patterning by directed self-assembly of block copolymers: process window study

Ahmed Gharbi; Raluca Tiron; Maxime Argoud; Xavier Chevalier; Patricia Pimenta-Barros; Célia Nicolet; Christophe Navarro

doi:10.1117/1.JMM.14.2.023508

18 June 2015 Contact holes patterning by directed self-assembly of block copolymers: process window study

Ahmed Gharbi, Raluca Tiron, Maxime Argoud, Xavier Chevalier, Patricia Pimenta-Barros, Célia Nicolet, Christophe Navarro

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 2, 023508 (June 2015). https://doi.org/10.1117/1.JMM.14.2.023508

Abstract

Contact hole (CH) patterning by directed self-assembly (DSA) of polystyrene-b-polymethylmethacrylate (PS-b-PMMA) block copolymers (BCPs) is extensively studied. Based on statistical analysis of defectivity and CD measurements after DSA, a process window (PW) for CH shrink is experimentally determined as a function of guiding pattern dimensions and BCP molecular weights corresponding to BCP natural periods. This PW permits to define the suitable BCP molecular weight and the best guiding CD ranges required to achieve a desired DSA hole CD within a specific tolerance. As an example, for a DSA hole CD targeted at 19.5 nm with 10% tolerance, circular guiding patterns of 52 nm CD with 20% guiding CD latitude are needed using a 35-nm-natural-period cylindrical BCP. Furthermore, it is shown that the CH shrink PW is also dependent on the guiding pattern density and the DSA process conditions such as the self-assembly annealing and the spin coating conditions. The study also highlights an interesting property of commensurability between guiding pattern dimensions and BCP’s natural period that governs the DSA CH patterning for both CH shrink and CH doubling configurations. This permits one to predict the guiding pattern dimensions needed for CH patterning by DSA using a given BCP of known natural period.

Citation Download Citation

Ahmed Gharbi, Raluca Tiron, Maxime Argoud, Xavier Chevalier, Patricia Pimenta-Barros, Célia Nicolet, and Christophe Navarro "Contact holes patterning by directed self-assembly of block copolymers: process window study," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(2), 023508 (18 June 2015). https://doi.org/10.1117/1.JMM.14.2.023508

Published: 18 June 2015

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE