Improvement and application of pad conditioning accuracy in chemical mechanical polishing

Xinxing Ban; Huiying Zhao; Xueliang Zhu; Shijie Zhao; Ruiqing Xie; Defeng Liao

doi:10.1117/1.OE.57.9.095102

17 September 2018 Improvement and application of pad conditioning accuracy in chemical mechanical polishing

Xinxing Ban, Huiying Zhao, Xueliang Zhu, Shijie Zhao, Ruiqing Xie, Defeng Liao

Author Affiliations +

Optical Engineering, Vol. 57, Issue 9, 095102 (September 2018). https://doi.org/10.1117/1.OE.57.9.095102

Abstract

Chemical mechanical polishing (CMP) is the key application process in the fabrication of large optical flats to achieve global planarity and smooth surface. The large-diameter pad is a significant part and plays a vital role in CMP. To improve the polishing quality and efficiency, high-profile accuracy of the pad, conditioned by a diamond conditioner, is necessary. However, the conventional conditioning method (CCM) has been unable to satisfy the machining requirements for optical flats, and it is a challenge to improve the conditioning accuracy of the large-diameter polyurethane pad. In this study, we propose an advanced conditioning method (ACM) using the idea of subaperture conditioning, which reduces the size of the conditioner and adds the traverse movement to control the removal of different regions. Based on the conditioning density distribution model, the effect of conditioner diameter and process parameters on the pad planarity is investigated. The conditioning accuracy of the pad and polishing quality of the optical flats obtained with ACM are compared with those of a CCM. Experimental results showed that ACM can create the surface shape of the pad more uniformly than CCM. Furthermore, the polishing accuracy of the large optical flats of ACM exceeds that of CCM.

Citation Download Citation

Xinxing Ban, Huiying Zhao, Xueliang Zhu, Shijie Zhao, Ruiqing Xie, and Defeng Liao "Improvement and application of pad conditioning accuracy in chemical mechanical polishing," Optical Engineering 57(9), 095102 (17 September 2018). https://doi.org/10.1117/1.OE.57.9.095102

Received: 22 May 2018; Accepted: 28 August 2018; Published: 17 September 2018

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