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Aaron G. Chin
Applications Engineer at KLA Singapore
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Author
Publications (2)
Proceedings Article | 5 April 2012 Paper
Reticle intensity-based critical dimension uniformity to improve efficiency for DOMA correction in a foundry
Kin Wai Tang, Teng Hwee Ng, Lei Huang, Susan Ng, Thomas Ku, Wee Teck Chia, Lin Chua, William Li, Aaron Chin, Aditya Dayal, Tom Vavul, Trent Hutchinson
Proceedings Volume 8324, 83242W (2012) https://doi.org/10.1117/12.916335
KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Inspection, Scanners, Yield improvement, Scanning electron microscopy, Information fusion, Calibration, Transistors
Proceedings Article | 17 October 2008 Paper
Crystal growth printability in an advanced foundry FAB: a correlation study between STARlight and ultra broadband BrightField inspection technologies
Teng Hwee Ng, Mohammed Fahmy bin Rahmat, Barry Saville, Patrick Pak, WeeTeck Chia, Aaron Chin, Mike VanRiet, Russell Dover, Raj Badoni
Proceedings Volume 7122, 712213 (2008) https://doi.org/10.1117/12.801868
KEYWORDS: Inspection, Reticles, Semiconducting wafers, Printing, Scanning electron microscopy, Defect detection, Crystals, Crystallography, Defect inspection, Contamination
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