Dr. Achintya Kundu Profile

Dr. Achintya Kundu

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EUV Lithography (0.33NA):
Screening Photoresist, Underlayers, and Rinse Materials for High Volume Manufacturing.
Collaboration with etch, deposition, and metrology

Publications (2)

Proceedings Article | 12 November 2024 Presentation + Paper

EUV dose reduction for pitch 28nm line-space

Mihir Gupta, Lander Verstraete, Joern-Holger Franke, Achintya Kundu, Roberto Fallica, Kurt Ronse, Emily Gallagher, Danilo De Simone, Vicky Philipsen, Hyo Seon Suh

Proceedings Volume 13215, 132150K (2024) https://doi.org/10.1117/12.3034646

KEYWORDS: Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Directed self assembly, Photoresist developing, Reticles, Photoresist materials, Line width roughness, Semiconducting wafers, Line edge roughness

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Proceedings Article | 12 November 2024 Presentation + Paper

Substantial dose reduction using dry deposited underlayer for EUV lithography while maintaining roughness and minimizing defects

Achintya Kundu, Mihir Gupta, Danilo De Simone, Pieter Vanelderen, Hyo Seon Suh, David De Roest, Dennis Christy, Fatemeh Davodi, Kishan Patel, Steaphan Wallace, Yiting Sun, Yoann Tomczak

Proceedings Volume 13215, 132150M (2024) https://doi.org/10.1117/12.3034575

KEYWORDS: Extreme ultraviolet lithography, Film thickness, Bubbles, Molecular bridges, Line width roughness, Bridges, Silica, Adhesion, Metal oxides, Extreme ultraviolet

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