In this paper, we present the development of Al-based multilayer mirrors for the spectral range [17 nm - 34 nm]. The
purpose of presented study is to optimize the deposition of Al-based multilayers by the ion beam sputtering (IBS)
technique according to several parameters such as the ion beam current and the angle of inclination of targets, which
allowed us to vary the energy of ad-atoms deposited onto a substrate. We expected to achieve good reflectivity values
for both two- and three-material stacks: aluminum/molybdenum Al/Mo, aluminum/molybdenum/boron carbide
Al/Mo/B4C and aluminum/molybdenum/silicon carbide Al/Mo/SiC. We have undertaken a series of structural and
chemical analyses of these systems. We present their optical characteristics in the EUV range.
We report on further development of three-material multilayer coatings made with a use of aluminum for the extreme
ultra-violet (EUV) applications such as solar physics, high-order harmonic generation or synchrotron radiation. It was
found that an introduction of refractory metal in Al-based periodic stack helps to reduce significantly an interfacial
roughness and provides for a higher theoretical reflectance in the spectral range from 17 to 40 nm. The normal incidence
reflectivity as high as 55 % at 17 nm, 50 % at 21 nm and 42 % at 30 nm was achieved with the new Al/Mo/SiC and
Al/Mo/B4C multilayer mirrors, which have been optimized, fabricated and characterized with x-rays and synchrotron
radiation. A good temporal and thermal stability of the tri-component Al-based multilayers has been observed over 3
years.
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