Amir Borna
at Univ of Michigan
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 5 May 2005 Paper
Amir Borna, Chris Progler, David Blaauw
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.604606
KEYWORDS: Critical dimension metrology, Transistors, Lithography, Optical proximity correction, Device simulation, Silicon, Image processing, Cadmium, Photomasks, Computer aided design

Proceedings Article | 3 May 2004 Paper
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.537259
KEYWORDS: Lithography, Critical dimension metrology, Monte Carlo methods, Error analysis, Optical proximity correction, Photomasks, Statistical analysis, Tolerancing, Manufacturing, Device simulation

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