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Andreas Englisch
at Toppan Photomasks Inc
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Author
Publications (3)
Proceedings Article | 9 April 2001 Paper
Canary reticle: a new diagnostic for reticles and a window into the physics of ESD damage to reticles
Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425101
KEYWORDS: Reticles, Diagnostics, Dielectrics, Quartz, Physics, Photomasks, Ions, Semiconducting wafers, Aluminum, Electrodes
Proceedings Article | 30 December 1999 Paper
CANARY: a high-sensitivity ESD test reticle design to evaluate potential risks in wafer fabs
Andreas Englisch, Kees van Hasselt, Michel Tissier, K. Wang
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373381
KEYWORDS: Reticles, Semiconducting wafers, Sputter deposition, Photomasks, Semiconductors, Reflectivity, Glasses, Deep ultraviolet, Photomask technology, Resistance
Proceedings Article | 1 June 1990 Paper
Automated lithocell
Andreas Englisch, Armin Deuter
Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20054
KEYWORDS: Reticles, Process control, Manufacturing, Integrated circuits, Metrology, Inspection, Databases, Lithography, Tolerancing, Microcontrollers
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