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Anne Lindgren
at Brewer Science Inc
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Publications (2)
Proceedings Article | 24 July 2002 Paper
Thin organic bottom antireflective coatings for 193 nm lithography
Mandar Bhave, James Meador, James Claypool, Shreeram Deshpande, Jill Akers, Anne Lindgren
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474183
KEYWORDS: Reflectivity, Photoresist materials, Polymers, Etching, Lithography, Bottom antireflective coatings, 193nm lithography, Absorbance, Optical properties, Critical dimension metrology
Proceedings Article | 23 June 2000 Paper
Second-generation 193-nm bottom antireflective coatings (BARCs)
James Meador, Xie Shao, Vandana Krishnamurthy, Mikko Arjona, Mandar Bhave, Gu Xu, James Claypool, Anne Lindgren
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388264
KEYWORDS: Reflectivity, Etching, Polymers, Plasma etching, Manufacturing, Photoresist materials, Lithography, Semiconducting wafers, Particles, Absorbance
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