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Atsushi Otake
at Mitsubishi Rayon Co Ltd
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Author
Publications (1)
Proceedings Article | 14 May 2004 Paper
Design and development of novel monomers and copolymers for 193-nm lithography
Atsushi Otake, Emi Araya, Hikaru Momose, Ryuichi Ansai, Masayuki Tooyama, Tadayuki Fujiwara
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534628
KEYWORDS: Polymers, Lithography, Hydrogen, Line edge roughness, Etching, Polymerization, Immersion lithography, Resistance, Transmittance, Chemical species
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