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Hikaru Momose
Chief Researcher at Mitsubishi Rayon Co Ltd
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Publications (4)
Proceedings Article | 23 March 2007 Paper
Chemical composition distribution analysis of photoresist copolymers and influence on ArF lithographic performance
Hikaru Momose, Atsushi Yasuda, Akifumi Ueda, Takayuki Iseki, Koichi Ute, Takashi Nishimura, Ryo Nakagawa, Tatsuki Kitayama
Proceedings Volume 6519, 65192F (2007) https://doi.org/10.1117/12.711760
KEYWORDS: Polymers, Photoresist materials, Polymerization, Lithography, Chemical analysis, Chromatography, Adsorption, Photoresist developing, Performance modeling, Magnetism
Proceedings Article | 14 May 2004 Paper
Design and development of novel monomers and copolymers for 193-nm lithography
Atsushi Otake, Emi Araya, Hikaru Momose, Ryuichi Ansai, Masayuki Tooyama, Tadayuki Fujiwara
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534628
KEYWORDS: Polymers, Lithography, Hydrogen, Line edge roughness, Etching, Polymerization, Immersion lithography, Resistance, Transmittance, Chemical species
Proceedings Article | 24 July 2002 Paper
Newly developed acrylic copolymers for ArF photoresist
Yoshihiro Kamon, Hikaru Momose, Hideaki Kuwano, Tadayuki Fujiwara, Masaharu Fujimoto
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474263
KEYWORDS: Etching, Polymers, Photoresist materials, Lithography, Carbon, Computer simulations, Semiconducting wafers, Photoresist developing, Manufacturing, Indium
Proceedings Article | 24 August 2001 Paper
Effect of end group structures of methacrylate polymers on ArF photoresist performances
Hikaru Momose, Shigeo Wakabayashi, Tadayuki Fujiwara, Kiyoshi Ichimura, Jun Nakauchi
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436903
KEYWORDS: Photoresist materials, Polymers, Transmittance, Semiconducting wafers, Photoresist developing, 193nm lithography, Lithography, Silicon, FT-IR spectroscopy, Microfabrication
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