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Benjamin Cherian
at Applied Materials, Inc.
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 26 May 2022 Presentation + Paper
New metrology technique for measuring patterned wafer geometry on a full 300mm wafer
Proceedings Volume 12053, 1205303 (2022) https://doi.org/10.1117/12.2614320
KEYWORDS: Semiconducting wafers, Silicon, Gaussian filters, Wavefronts, Wafer-level optics, Metrology, Cameras, Overlay metrology, Imaging systems, Data acquisition
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