CONFERENCE PROCEEDINGS
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Dr. Chao-Peng Chen
at Headway Technologies Inc
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Publications (4)
Proceedings Article | 24 March 2006 Paper
Sub-100nm trackwidth development by e-beam lithography for advanced magnetic recording heads
Jei-Wei Chang, Chao-Peng Chen
Proceedings Volume 6151, 61513B (2006) https://doi.org/10.1117/12.654547
KEYWORDS: Electron beam lithography, Etching, Magnetism, Head, Bridges, Critical dimension metrology, Scattering, Ozone, Magnetic tracking, Laser scattering
Proceedings Article | 6 May 2005 Paper
Process control of photoresist undercut for lift-off patterns below 100 nm
Chao-Peng Chen, Jei-Wei Chang, Rina Kaji, Hromichi Kawasaki
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.584174
KEYWORDS: Photoresist materials, Critical dimension metrology, Ozone, Photoresist developing, Semiconducting wafers, Lithography, Process control, Line edge roughness, Microelectronics, Oxidation
Proceedings Article | 14 May 2004 Paper
Electron-beam assisted resist sidewall angle control and its applications
Jei-Wei Chang, Chao-Peng Chen
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.530381
KEYWORDS: Photoresist processing, Chemically amplified resists, Monte Carlo methods, Image processing, Scattering, Lithography, Electron beam lithography, Magnetism, Deep ultraviolet, Floods
Proceedings Article | 16 June 2003 Paper
Electron-beam-assisted critical dimension reduction
Jei-Wei Chang, Chao-Peng Chen, Robert Yang
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484681
KEYWORDS: Dimension reduction, Photoresist processing, Floods, Monte Carlo methods, Chemically amplified resists, Lithography, Scattering, Electron beam lithography, Laser scattering, Line edge roughness
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