CONFERENCE PROCEEDINGS
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Christian Cloin
at ASML Netherlands BV
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Author
Publications (4)
Proceedings Article | 21 November 2023 Presentation + Paper
EUV reticle defectivity: next steps in the EUV scanner and beyond
Derk Brouns, Christian Cloin, Tahmid Hossain, Elena Nedanovska
Proceedings Volume 12751, 127510L (2023) https://doi.org/10.1117/12.2682101
KEYWORDS: Reticles, Particles, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, 3D modeling, Data modeling, Systems modeling, Solid modeling, Semiconducting wafers
Proceedings Article | 5 March 2021 Presentation + Paper
Particle removal tool to repair particle defects on EUV reticles
Proceedings Volume 11609, 116090N (2021) https://doi.org/10.1117/12.2583981
KEYWORDS: Particles, Reticles, Extreme ultraviolet, Tin, X-rays, Statistical analysis, Scanning electron microscopy, Scanners, Photomasks, Pellicles
Proceedings Article | 23 August 2020 Presentation + Paper
Particulate and molecular contamination control in EUV-induced H2-plasma in EUV lithographic scanner
Mark van de Kerkhof, Ernst Galutschek, Andrei Yakunin, Selwyn Cats, Christian Cloin
Proceedings Volume 11489, 114890K (2020) https://doi.org/10.1117/12.2569997
KEYWORDS: Plasma, Reticles, Particles, Hydrogen, Scanners, Extreme ultraviolet lithography, Extreme ultraviolet
Proceedings Article | 26 March 2019 Presentation + Paper
Advanced particle contamination control in EUV scanners
Proceedings Volume 10957, 109570U (2019) https://doi.org/10.1117/12.2514874
KEYWORDS: Particles, Reticles, Scanners, Pellicles, Plasma, Extreme ultraviolet, Particle contamination
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